Modular model-based supervisory controller design for wafer logistics in lithography machines

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

16 Citaten (Scopus)
6 Downloads (Pure)

Samenvatting

Development of high-level supervisory controllers is an important challenge in the design of high-tech systems. It has become a significant issue due to increased complexity, combined with demands for verified quality, time to market, ease of development, and integration of new functionality. To deal with these challenges, model-based engineering approaches
are suggested as a cost-effective way to support easy adaptation, validation, synthesis, and verification of controllers. This paper presents an industrial case study on modular design of a supervisory controller for wafer logistics in lithography machines. The uncontrolled system and control requirements are modeled independently in a modular way, using small, loosely coupled and minimally restrictive extended finite automata. The multiparty synchronization mechanism that is part of the specification formalism provides clear advantages in terms of modularity, traceability, and adaptability of the model. We show that being able to refer to variables and states of automata in guard expressions and state-based requirements, enabled by the use of extended finite automata, provides concise models. Additionally, we show how modular synthesis allows construction of local supervisors that ensure safety of parts of the system, since monolithic synthesis is not feasible for our industrial case.
Originele taal-2Engels
Titel2015 ACM/IEEE 18th International Conference on Model Driven Engineering Languages and Systems (MODELS)
SubtitelProceedings
Plaats van productiePiscataway
UitgeverijACM/IEEE
Pagina's416-425
Aantal pagina's10
ISBN van elektronische versie978-1-4673-6908-4
ISBN van geprinte versie978-1-4673-6909-1
DOI's
StatusGepubliceerd - sep 2015
Evenement18th ACM/IEEE International Conference on Model Driven Engineering Languages and Systems (MODELS 2015) - Ottawa, Canada
Duur: 30 sep 20152 okt 2015
Congresnummer: 18
http://cruise.eecs.uottawa.ca/models2015/

Congres

Congres18th ACM/IEEE International Conference on Model Driven Engineering Languages and Systems (MODELS 2015)
Verkorte titelMODELS 2015
LandCanada
StadOttawa
Periode30/09/152/10/15
Internet adres

Vingerafdruk Duik in de onderzoeksthema's van 'Modular model-based supervisory controller design for wafer logistics in lithography machines'. Samen vormen ze een unieke vingerafdruk.

Citeer dit