Method for forming microscopic structures on a substrate

A.F. Jong, de (Uitvinder), J.J.L. Mulders (Uitvinder), W.M.M. Kessels (Uitvinder), A.J.M. Mackus (Uitvinder)

Onderzoeksoutput: OctrooiOctrooi-publicatie

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Samenvatting

The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. An advantage of this method is that forming the seed layer takes relatively little time, as only a very thin layer needs to be deposited.
Originele taal-2Engels
OctrooinummerUS2010159370
StatusGepubliceerd - 24 jun 2010

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