Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

H.W. Vries, de (Uitvinder), E. Aldea (Uitvinder), S. Starostine (Uitvinder), M. Creatore (Uitvinder), M.C.M. Sanden, van de (Uitvinder)

Onderzoeksoutput: OctrooiOctrooi-publicatie

Uittreksel

Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.
Originele taal-2Engels
OctrooinummerWO2007139379
StatusGepubliceerd - 6 dec 2007

Vingerafdruk

gas composition
glow discharges
chemical compounds
chemical elements
power supplies
gas mixtures
rare gases
atmospheric pressure
dust
nitrogen
electrodes
pulses

Citeer dit

Vries, de, H.W. (Uitvinder) ; Aldea, E. (Uitvinder) ; Starostine, S. (Uitvinder) ; Creatore, M. (Uitvinder) ; Sanden, van de, M.C.M. (Uitvinder). / Method and apparatus for deposition using pulsed atomspheric pressure glow discharge. Octrooi Nr.: WO2007139379.
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abstract = "Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.",
author = "{Vries, de}, H.W. and E. Aldea and S. Starostine and M. Creatore and {Sanden, van de}, M.C.M.",
year = "2007",
month = "12",
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Method and apparatus for deposition using pulsed atomspheric pressure glow discharge. / Vries, de, H.W. (Uitvinder); Aldea, E. (Uitvinder); Starostine, S. (Uitvinder); Creatore, M. (Uitvinder); Sanden, van de, M.C.M. (Uitvinder).

Octrooi Nr.: WO2007139379.

Onderzoeksoutput: OctrooiOctrooi-publicatie

TY - PAT

T1 - Method and apparatus for deposition using pulsed atomspheric pressure glow discharge

AU - Vries, de, H.W.

AU - Aldea, E.

AU - Starostine, S.

AU - Creatore, M.

AU - Sanden, van de, M.C.M.

PY - 2007/12/6

Y1 - 2007/12/6

N2 - Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two 5 electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited.. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition 10 in the treatment space. Best results are obtained when using a stabilized plasma.

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