Method and apparatus for atomic layer desposition using an atmospheric pressure glow discharge plasma

H.W. Vries, de (Uitvinder), M.C.M. Sanden, van de (Uitvinder), M. Creatore (Uitvinder), W.M.M. Kessels (Uitvinder)

Onderzoeksoutput: OctrooiOctrooi-publicatie

Uittreksel

Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.
Originele taal-2Engels
OctrooinummerWO2007145513
StatusGepubliceerd - 21 dec 2007

Vingerafdruk

glow discharges
gas mixtures
atmospheric pressure
molecules
plasma generators
atomic layer epitaxy
gases

Citeer dit

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abstract = "Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.",
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year = "2007",
month = "12",
day = "21",
language = "English",
type = "Patent",
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AU - Vries, de, H.W.

AU - Sanden, van de, M.C.M.

AU - Creatore, M.

AU - Kessels, W.M.M.

PY - 2007/12/21

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AB - Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.

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