TY - PAT
T1 - Method and apparatus for angular-resolved spectroscopic lithography characterization
AU - Boef, den, A.J.
AU - Bleeker, A.J.
AU - Dommelen, van, Y.J.L.M.
AU - Dusa, M.
AU - Kiers, A.G.M.
AU - Lührmann, P.F.
AU - Pellemans, H.P.M.
AU - van der Schaar, M.
AU - Grouwstra, C.D.
AU - Kraaij, van, M.G.M.M.
PY - 2006/2/22
Y1 - 2006/2/22
N2 - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.
AB - An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized light and their relative phase difference.
UR - http://v3.espacenet.com/publicationDetails/biblio?CC=EP&NR=1628164A2&KC=A2&FT=D&date=20060222&DB=EPODOC&locale=en_EP
M3 - Patent publication
M1 - EP1628164 (A2)
ER -