Uittreksel
| Originele taal-2 | Engels |
|---|---|
| Pagina's (van-tot) | 7479-7485 |
| Aantal pagina's | 7 |
| Tijdschrift | Advanced Materials |
| Volume | 28 |
| Nummer van het tijdschrift | 34 |
| DOI's | |
| Status | Gepubliceerd - 14 sep 2016 |
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Metal–organic covalent network chemical vapor deposition for gas separation. / Boscher, N.D.; Wang, M.; Perrotta, A.; Heinze, K.; Creatore, A.; Gleason, K.K.
In: Advanced Materials, Vol. 28, Nr. 34, 14.09.2016, blz. 7479-7485.Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review
TY - JOUR
T1 - Metal–organic covalent network chemical vapor deposition for gas separation
AU - Boscher, N.D.
AU - Wang, M.
AU - Perrotta, A.
AU - Heinze, K.
AU - Creatore, A.
AU - Gleason, K.K.
PY - 2016/9/14
Y1 - 2016/9/14
N2 - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
AB - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.
KW - free-radical polymerization
KW - gas separation
KW - iPECVD
KW - metalloporphyrins
KW - metal–organic covalent networks
UR - http://www.scopus.com/inward/record.url?scp=84985994923&partnerID=8YFLogxK
U2 - 10.1002/adma.201601010
DO - 10.1002/adma.201601010
M3 - Article
C2 - 27296896
AN - SCOPUS:84985994923
VL - 28
SP - 7479
EP - 7485
JO - Advanced Materials
JF - Advanced Materials
SN - 0935-9648
IS - 34
ER -