Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher; M. Wang; A. Perrotta; K. Heinze; A. Creatore; K.K. Gleason

doi:10.1002/adma.201601010

Metal–organic covalent network chemical vapor deposition for gas separation

N.D. Boscher, M. Wang, A. Perrotta, K. Heinze, A. Creatore, K.K. Gleason

Plasma & Materials Processing

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

24 Citaten (Scopus)

Samenvatting

The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

Originele taal-2	Engels
Pagina's (van-tot)	7479-7485
Aantal pagina's	7
Tijdschrift	Advanced Materials
Volume	28
Nummer van het tijdschrift	34
DOI's	https://doi.org/10.1002/adma.201601010
Status	Gepubliceerd - 14 sep 2016

Toegang tot document

10.1002/adma.201601010

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Citeer dit

@article{fd2aea01d6494157a00cbf08d92e4a9e,

title = "Metal–organic covalent network chemical vapor deposition for gas separation",

abstract = "The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs. ",

keywords = "free-radical polymerization, gas separation, iPECVD, metalloporphyrins, metal–organic covalent networks",

author = "N.D. Boscher and M. Wang and A. Perrotta and K. Heinze and A. Creatore and K.K. Gleason",

year = "2016",

month = sep,

day = "14",

doi = "10.1002/adma.201601010",

language = "English",

volume = "28",

pages = "7479--7485",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "34",

}

TY - JOUR

T1 - Metal–organic covalent network chemical vapor deposition for gas separation

AU - Boscher, N.D.

AU - Wang, M.

AU - Perrotta, A.

AU - Heinze, K.

AU - Creatore, A.

AU - Gleason, K.K.

PY - 2016/9/14

Y1 - 2016/9/14

N2 - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

AB - The chemical vapor deposition (CVD) polymerization of metalloporphyrin building units is demonstrated to provide an easily up-scalable one-step method toward the deposition of a new class of dense and defect-free metal–organic covalent network (MOCN) layers. The resulting hyper-thin and flexible MOCN layers exhibit outstanding gas-separation performances for multiple gas pairs.

KW - free-radical polymerization

KW - gas separation

KW - iPECVD

KW - metalloporphyrins

KW - metal–organic covalent networks

UR - http://www.scopus.com/inward/record.url?scp=84985994923&partnerID=8YFLogxK

U2 - 10.1002/adma.201601010

DO - 10.1002/adma.201601010

M3 - Article

C2 - 27296896

AN - SCOPUS:84985994923

VL - 28

SP - 7479

EP - 7485

JO - Advanced Materials

JF - Advanced Materials

SN - 0935-9648

IS - 34

ER -