Material structure of microcrystalline silicon deposited with an expanding thermal plasma

C. Smit; D.L. Williamson; M.C.M. Sanden, van de; R.A.C.M.M. Swaaij, van

Material structure of microcrystalline silicon deposited with an expanding thermal plasma

C. Smit, D.L. Williamson, M.C.M. Sanden, van de, R.A.C.M.M. Swaaij, van

Plasma & Materials Processing

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

Originele taal-2	Engels
Titel	Amorphous and nanocrystalline silicon-based films
Plaats van productie	Warrendale, Pa
Uitgeverij	Materials Research Society
Pagina's	527-532
ISBN van geprinte versie	1-558-99699-0
Status	Gepubliceerd - 2003
Evenement	2003 Amorphous and Nanocrystalline Silicon-Based Films Symposium - San Francisco, Verenigde Staten van Amerika Duur: 22 apr. 2003 → 25 apr. 2003

Publicatie series

Naam	Materials Research Society Symposium Proceedings
Volume	762
ISSN van geprinte versie	0272-9172

Congres

Congres	2003 Amorphous and Nanocrystalline Silicon-Based Films Symposium
Land/Regio	Verenigde Staten van Amerika
Stad	San Francisco
Periode	22/04/03 → 25/04/03
Ander	Symposium A: "Amorphous and Nanocrystalline Silicon-Based Films" ; (San Francisco, Calif.) : 2003.04.22-25

Citeer dit

@inproceedings{abab117db9354cd7a4fb0cfd427a6d3b,

title = "Material structure of microcrystalline silicon deposited with an expanding thermal plasma",

author = "C. Smit and D.L. Williamson and {Sanden, van de}, M.C.M. and {Swaaij, van}, R.A.C.M.M.",

year = "2003",

language = "English",

isbn = "1-558-99699-0",

series = "Materials Research Society Symposium Proceedings",

publisher = "Materials Research Society",

pages = "527--532",

booktitle = "Amorphous and nanocrystalline silicon-based films",

address = "United States",

note = "2003 Amorphous and Nanocrystalline Silicon-Based Films Symposium ; Conference date: 22-04-2003 Through 25-04-2003",

}

Smit, C, Williamson, DL, Sanden, van de, MCM & Swaaij, van, RACMM 2003, Material structure of microcrystalline silicon deposited with an expanding thermal plasma. in Amorphous and nanocrystalline silicon-based films. Materials Research Society Symposium Proceedings, vol. 762, Materials Research Society, Warrendale, Pa, blz. 527-532, 2003 Amorphous and Nanocrystalline Silicon-Based Films Symposium, San Francisco, California, Verenigde Staten van Amerika, 22/04/03.

Material structure of microcrystalline silicon deposited with an expanding thermal plasma. / Smit, C.; Williamson, D.L.; Sanden, van de, M.C.M. et al.

Amorphous and nanocrystalline silicon-based films. Warrendale, Pa : Materials Research Society, 2003. blz. 527-532 (Materials Research Society Symposium Proceedings; Vol. 762).

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Material structure of microcrystalline silicon deposited with an expanding thermal plasma

AU - Smit, C.

AU - Williamson, D.L.

AU - Sanden, van de, M.C.M.

AU - Swaaij, van, R.A.C.M.M.

PY - 2003

Y1 - 2003

M3 - Conference contribution

SN - 1-558-99699-0

T3 - Materials Research Society Symposium Proceedings

SP - 527

EP - 532

BT - Amorphous and nanocrystalline silicon-based films

PB - Materials Research Society

CY - Warrendale, Pa

T2 - 2003 Amorphous and Nanocrystalline Silicon-Based Films Symposium

Y2 - 22 April 2003 through 25 April 2003

ER -