Matching repetitive pulsed power to industrial processes

E.J.M. Heesch, van; K. Yan; A.J.M. Pemen; S.A. Nair; G.J.J. Winands; I. Jong, de

doi:10.1541/ieejfms.124.607

Matching repetitive pulsed power to industrial processes

E.J.M. Heesch, van, K. Yan, A.J.M. Pemen, S.A. Nair, G.J.J. Winands, I. Jong, de

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

10 Citaten (Scopus)

Samenvatting

Repetitive pulsed power techniques have enormous potential for a wide range of applications, such as nano-particle and hydrogen production, gas and water processing and sterilization, and generation of X-ray, EUV, and high-power acoustics. This paper presents the state of the art of our activities on repetitive ultra-short and microsecond pulsed power sources, pulsed thermal and streamer corona plasmas. Critical circuit elements are heavy-duty thyristors, transmission line transformers, and triggered spark-gap switches.

Originele taal-2	Engels
Pagina's (van-tot)	607-612
Aantal pagina's	6
Tijdschrift	IEEJ Transactions on Fundamentals and Materials
Volume	124
Nummer van het tijdschrift	7
DOI's	https://doi.org/10.1541/ieejfms.124.607
Status	Gepubliceerd - 2004

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Matching repetitive pulsed power to industrial processes

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Duurzame ontwikkelingsdoelstellingen van de VN

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