Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si

R. Mansell, D. C. M. C. Petit, A. Fernandez-Pacheco, R. Lavrijsen, J. H. Lee, R. P. Cowburn

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

4 Citaties (Scopus)

Uittreksel

Thin films of Co and Co/Cu/Co trilayers with wedged Cu interlayers were grown epitaxially on Cu buffer layers on hydrogen passivated Si(001) wafers. We find that single Co layers have a well-defined four-fold anisotropy but with smaller in-plane anisotropies than observed in Co grown on Cu crystals. Ruderman–Kittel–Kasuya–Yosida (RKKY) interlayer coupling is observed in one Co/Cu/Co sample which is the smoothest of the films as measured by atomic force microscopy. Some of the films also form a dot-like structure on the surface. Intermixing at elevated temperatures between the Cu buffer and Si limits the ability to form flat surfaces to promote RKKY coupling.
Originele taal-2Engels
Artikelnummer063906
Pagina's (van-tot)1-6
TijdschriftJournal of Applied Physics
Volume116
Nummer van het tijdschrift6
DOI's
StatusGepubliceerd - 14 aug 2014

Citeer dit

Mansell, R., Petit, D. C. M. C., Fernandez-Pacheco, A., Lavrijsen, R., Lee, J. H., & Cowburn, R. P. (2014). Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. Journal of Applied Physics, 116(6), 1-6. [063906]. https://doi.org/10.1063/1.4893306
Mansell, R. ; Petit, D. C. M. C. ; Fernandez-Pacheco, A. ; Lavrijsen, R. ; Lee, J. H. ; Cowburn, R. P. / Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. In: Journal of Applied Physics. 2014 ; Vol. 116, Nr. 6. blz. 1-6.
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Mansell, R, Petit, DCMC, Fernandez-Pacheco, A, Lavrijsen, R, Lee, JH & Cowburn, RP 2014, 'Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si', Journal of Applied Physics, vol. 116, nr. 6, 063906, blz. 1-6. https://doi.org/10.1063/1.4893306

Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. / Mansell, R.; Petit, D. C. M. C.; Fernandez-Pacheco, A.; Lavrijsen, R.; Lee, J. H.; Cowburn, R. P.

In: Journal of Applied Physics, Vol. 116, Nr. 6, 063906, 14.08.2014, blz. 1-6.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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Mansell R, Petit DCMC, Fernandez-Pacheco A, Lavrijsen R, Lee JH, Cowburn RP. Magnetic properties and interlayer coupling of epitaxial Co/Cu films on Si. Journal of Applied Physics. 2014 aug 14;116(6):1-6. 063906. https://doi.org/10.1063/1.4893306