Low-pressure chemical vapor deposition as a tool for deposition of thin film battery materials

J.F.M. Oudenhoven, T. Dongen, van, R.A.H. Niessen, M.H.J.M. Croon, de, P.H.L. Notten

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

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Samenvatting

Low Pressure Chemical Vapor Deposition was utilized for the deposition of LiCoO2 cathode materials for all-solid-state thin-film micro-batteries. To obtain insight in the deposition process, the most important process parameters were optimized for the deposition of crystalline electrode films on planar substrates. Also the electrochemical activity of the obtained LiCoO2 films was demonstrated. © The Electrochemical Society.
Originele taal-2Engels
Titel17th International Chemical Vapor Deposition Symposium (CVD-XVII) as part of the 216th Meeting of the Electrochemical Society 4 -9 October 2009, Vienna
Plaats van productiePennington, NJ
UitgeverijElectrochemical Society, Inc.
Pagina's653-658
ISBN van geprinte versie978-156677745-2
DOI's
StatusGepubliceerd - 2009

Publicatie series

NaamECS Transactions
Volume25
ISSN van geprinte versie1938-6737

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