Low hydrogen incorporation in microwave downstream deposited SiO2 layers

J.G. Hassel, van, L.J. IJzendoorn, van

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

Originele taal-2Engels
TitelProc. 21st State of the Art Progr. on Compound Semiconductors, SOTAPOCS XXI, 186th Meeting of the Electrochemical Society
Pagina's197-204
StatusGepubliceerd - 1994
Evenementconference; Proc. 21st State of the Art Progr. on Compound Semiconductors, SOTAPOCS XXI, 186th Meeting of the Electrochemical Society, Miami Beach, FL, 9 October 1994 -
Duur: 1 jan 1994 → …

Congres

Congresconference; Proc. 21st State of the Art Progr. on Compound Semiconductors, SOTAPOCS XXI, 186th Meeting of the Electrochemical Society, Miami Beach, FL, 9 October 1994
Periode1/01/94 → …
AnderProc. 21st State of the Art Progr. on Compound Semiconductors, SOTAPOCS XXI, 186th Meeting of the Electrochemical Society, Miami Beach, FL, 9 October 1994

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