Local deposition of high-purity Pt nanostructures by combining electron beam induced deposition and atomic layer deposition

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An approach for direct-write fabrication of high-purity platinum nanostructures has been developed by combining nanoscale lateral patterning by electron beam induced deposition (EBID) with area-selective deposition of high quality material by atomic layer deposition (ALD). Because virtually pure, polycrystalline Pt nanostructures are obtained, the method extends the application possibilities of EBID, whereas compared to other area-selective ALD approaches, a much higher resolution is attainable; potentially down to sub-10 nm lateral dimensions.
Originele taal-2Engels
Artikelnummer116102
Pagina's (van-tot)116102-1/3
Aantal pagina's3
TijdschriftJournal of Applied Physics
Volume107
Nummer van het tijdschrift11
DOI's
StatusGepubliceerd - 2010

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