Lithographic linear motor, lithographic apparatus, and device manufacturing method

S.A.J Hol; J.C. Compter; E.R. Loopstra; P. Vreugdewater

Lithographic linear motor, lithographic apparatus, and device manufacturing method

S.A.J Hol (Uitvinder)
, J.C. Compter (Uitvinder)
, E.R. Loopstra (Uitvinder)
, P. Vreugdewater (Uitvinder)

Electromechanics and Power Electronics

Onderzoeksoutput: Octrooi › Octrooi-publicatie

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A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.

Originele taal-2	Engels
Octrooinummer	US7095485
Status	Gepubliceerd - 22 aug. 2006

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title = "Lithographic linear motor, lithographic apparatus, and device manufacturing method",

abstract = "A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.",

author = "S.A.J Hol and J.C. Compter and E.R. Loopstra and P. Vreugdewater",

year = "2006",

month = aug,

day = "22",

language = "English",

type = "Patent",

note = "US7095485",

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T1 - Lithographic linear motor, lithographic apparatus, and device manufacturing method

AU - Hol, S.A.J

AU - Compter, J.C.

AU - Loopstra, E.R.

AU - Vreugdewater, P.

PY - 2006/8/22

Y1 - 2006/8/22

N2 - A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.

AB - A linear motor having a high driving force, high efficiency and low normal force comprises two opposed magnet tracks and an armature comprising three open coil sets. The linear motor may be used to drive a stage, such as, for example, a mask or wafer stage, in a lithographic apparatus.

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M3 - Patent publication

M1 - US7095485

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Lithographic linear motor, lithographic apparatus, and device manufacturing method

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