Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

J.C.M. Jasper; M.K.M. Baggen; R.J. Bruls; O.S. Cicilia; H.A.L. van Dijck; G.C.J. Hofmans; A.J.M. Jansen; C.C.M. Luijten; W.R. Pongers; M.G.D. Wehrens; T. Uitterdijk; H. Boom; M.J.L.M. Demarteau

Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

J.C.M. Jasper (Uitvinder), M.K.M. Baggen (Uitvinder), R.J. Bruls (Uitvinder), O.S. Cicilia (Uitvinder), H.A.L. van Dijck (Uitvinder), G.C.J. Hofmans (Uitvinder), A.J.M. Jansen (Uitvinder), C.C.M. Luijten (Uitvinder), W.R. Pongers (Uitvinder), M.G.D. Wehrens (Uitvinder), T. Uitterdijk (Uitvinder), H. Boom (Uitvinder), M.J.L.M. Demarteau (Uitvinder)

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A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

Originele taal-2	Engels
Octrooinummer	US2008137049
Status	Gepubliceerd - 12 jun. 2008

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Jasper, J. C. M., Baggen, M. K. M., Bruls, R. J., Cicilia, O. S., van Dijck, H. A. L., Hofmans, G. C. J., Jansen, A. J. M., Luijten, C. C. M., Pongers, W. R., Wehrens, M. G. D., Uitterdijk, T., Boom, H., & Demarteau, M. J. L. M. (2008). Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle. (Octrooi Nr. US2008137049).

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abstract = "A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.",

author = "J.C.M. Jasper and M.K.M. Baggen and R.J. Bruls and O.S. Cicilia and {van Dijck}, H.A.L. and G.C.J. Hofmans and A.J.M. Jansen and C.C.M. Luijten and W.R. Pongers and M.G.D. Wehrens and T. Uitterdijk and H. Boom and M.J.L.M. Demarteau",

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T1 - Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

AU - Jasper, J.C.M.

AU - Baggen, M.K.M.

AU - Bruls, R.J.

AU - Cicilia, O.S.

AU - van Dijck, H.A.L.

AU - Hofmans, G.C.J.

AU - Jansen, A.J.M.

AU - Luijten, C.C.M.

AU - Pongers, W.R.

AU - Wehrens, M.G.D.

AU - Uitterdijk, T.

AU - Boom, H.

AU - Demarteau, M.J.L.M.

PY - 2008/6/12

Y1 - 2008/6/12

N2 - A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

AB - A thick pellicle is allowed to have a non-flat shape and its shape is characterized to calculate corrections to be applied in exposures to compensate for the optical effects of the pellicle. The pellicle may be mounted so as to adopt a one-dimensional shape under the influence of gravity to make the compensation easier.

UR - http://v3.espacenet.com/publicationDetails/biblio?DB=EPODOC&adjacent=true&locale=nl_NL&FT=D&date=20080612&CC=US&NR=2008137049A1&KC=A1

M3 - Patent publication

M1 - US2008137049

ER -

Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle

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