Lithographic apparatus and device manufacturing method

P.R. Bartray; W.J. Box; C.C.M. Luijten; M.A.J. Luttikhuis; M. Bhomer, ten; F. Migchelbrink; J.J. Kuit

Lithographic apparatus and device manufacturing method

P.R. Bartray (Uitvinder), W.J. Box (Uitvinder), C.C.M. Luijten (Uitvinder), M.A.J. Luttikhuis (Uitvinder), M. Bhomer, ten (Uitvinder), F. Migchelbrink (Uitvinder), J.J. Kuit (Uitvinder)

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A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.

Originele taal-2	Engels
Octrooinummer	US2005151954
Status	Gepubliceerd - 14 jul. 2005

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title = "Lithographic apparatus and device manufacturing method",

abstract = "A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.",

author = "P.R. Bartray and W.J. Box and C.C.M. Luijten and M.A.J. Luttikhuis and {Bhomer, ten}, M. and F. Migchelbrink and J.J. Kuit",

year = "2005",

month = jul,

day = "14",

language = "English",

type = "Patent",

note = "US2005151954",

}

TY - PAT

T1 - Lithographic apparatus and device manufacturing method

AU - Bartray, P.R.

AU - Box, W.J.

AU - Luijten, C.C.M.

AU - Luttikhuis, M.A.J.

AU - Bhomer, ten, M.

AU - Migchelbrink, F.

AU - Kuit, J.J.

PY - 2005/7/14

Y1 - 2005/7/14

N2 - A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.

AB - A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9x10/K.

UR - http://v3.espacenet.com/publicationDetails/biblio?DB=EPODOC&adjacent=true&locale=nl_NL&FT=D&date=20050714&CC=US&NR=2005151954A1&KC=A1

M3 - Patent publication

M1 - US2005151954

ER -

Lithographic apparatus and device manufacturing method

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