Line-to-line repetitive control of a 6-DoF hexapod stage for overlay measurements using Atomic Force Microscopy

Gert Witvoet, Joost Peters, Stefan Kuiper, Tom Oomen

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

2 Citaten (Scopus)

Samenvatting

The overlay performance between different layers of semiconductor devices is a key parameter for correct functionality of such devices. With device features getting increasingly smaller, there is a need for novel and more accurate overlay metrology tools. This paper aims to increase the positioning accuracy of such a novel metrology machine below the nanometer by the application of repetitive control. At the heart of the machine is a large stroke 6-DoF hexapod motion stage, carrying a sub-nanometer accurate AFM head, whose positioning accuracy during scanning is a key performance driver. The sample under examination during scanning effectively forms an unknown repetitive disturbance on its feedback loop. For this reason a line-to-line repetitive controller in combination with decentralized feedback has been employed, in which the base harmonic is defined by one full line-scan. Experimental results on the machine with an emulated sample demonstrate a significant performance improvement, achieving nanometer accurate positioning while scanning. This shows that repetitive control in a line-to-line domain is a potential enabler for AFM-based overlay nanometrology.

Originele taal-2Engels
Titel2019 American Control Conference, ACC 2019
Plaats van productiePiscataway
UitgeverijInstitute of Electrical and Electronics Engineers
Pagina's2464-2469
Aantal pagina's6
ISBN van elektronische versie978-1-5386-7926-5
DOI's
StatusGepubliceerd - 1 jul 2019
Evenement2019 American Control Conference, ACC 2019 - Philadelphia, Verenigde Staten van Amerika
Duur: 10 jul 201912 jul 2019
http://acc2019.a2c2.org

Congres

Congres2019 American Control Conference, ACC 2019
Verkorte titelACC2019
LandVerenigde Staten van Amerika
StadPhiladelphia
Periode10/07/1912/07/19
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  • Citeer dit

    Witvoet, G., Peters, J., Kuiper, S., & Oomen, T. (2019). Line-to-line repetitive control of a 6-DoF hexapod stage for overlay measurements using Atomic Force Microscopy. In 2019 American Control Conference, ACC 2019 (blz. 2464-2469). [8814385] Institute of Electrical and Electronics Engineers. https://doi.org/10.23919/acc.2019.8814385