Samenvatting
Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass.
Originele taal-2 | Engels |
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Titel | Selected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6 - 10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications] |
Redacteuren | H. Pulker, H. Schmidt, M.A. Aegerter |
Plaats van productie | Amsterdam |
Uitgeverij | Elsevier |
Pagina's | 178-180 |
Status | Gepubliceerd - 1999 |
Evenement | conference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 - Duur: 6 sep. 1998 → 9 sep. 1998 |
Congres
Congres | conference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 |
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Periode | 6/09/98 → 9/09/98 |
Ander | International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10 |