Kinetic study of the chemical vapor deposition of tin oxidereactor design, "Coatings on Glass 1998"

A.M.B. Mol, van, G.R. Alcott, M.H.J.M. Croon, de, C.I.M.A. Spee, J.C. Schouten

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

Samenvatting

Chem. Vapor Deposition is the result of a complicated interplay between gas phase chem., surface chem., and fluid dynamics of the reactor system. To improve in-line process control of an industrial deposition process, knowledge of all three phenomena is necessary. To study the intrinsic gas phase and surface kinetics of such a process at atm. pressure, a continuously stirred tank reactor has been designed. Gas phase kinetics is detd. using in situ Fourier transform IR spectroscopy and mass spectroscopy, whereas deposition rates are measured in situ with a microbalance. The present objective is a kinetic study of the intrinsic gas phase and surface chem. of the atm. pressure chem. vapor deposition of SnO2 layers on glass.
Originele taal-2Engels
TitelSelected papers from the 2nd International Conference on Coatings on Glass (ICCG) : Convention Center, Saarbrücken, Germany, September 6 - 10, 1998 ; [high-performance coatings for transparent systems in large-area and/or high-volume applications]
RedacteurenH. Pulker, H. Schmidt, M.A. Aegerter
Plaats van productieAmsterdam
UitgeverijElsevier
Pagina's178-180
StatusGepubliceerd - 1999
Evenementconference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09 -
Duur: 6 sep. 19989 sep. 1998

Congres

Congresconference; International Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10; 1998-09-06; 1998-09-09
Periode6/09/989/09/98
AnderInternational Conference on Coatings on Glass (ICCG) ; 2 (Saarbrücken) : 1998.09.06-10

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