Kinetic control of morphology and composition in Ge/GeSn core/shell nanowires

Simone Assali (Corresponding author), Roberto Bergamaschini (Corresponding author), Emilio Scalise (Corresponding author), Marcel A. Verheijen, Marco Albani, Alain Dijkstra, Ang Li, Sebastian Koelling, Erik P.A.M. Bakkers, Francesco Montalenti, Leo Miglio

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

19 Citaten (Scopus)
91 Downloads (Pure)

Samenvatting

The growth of Sn-rich group-IV semiconductors at the nanoscale can enrich the understanding of the fundamental properties of metastable GeSn alloys. Here, we demonstrate the effect of the growth conditions on the morphology and composition of Ge/GeSn core/shell nanowires by correlating the experimental observations with a theoretical interpretation based on a multiscale approach. We show that the cross-sectional morphology of Ge/GeSn core/shell nanowires changes from hexagonal to dodecagonal upon increasing the supply of the Sn precursor. This transformation strongly influences the Sn distribution as a higher Sn content is measured under the {112} growth front. Ab initio DFT calculations provide an atomic-scale explanation by showing that Sn incorporation is favored at the {112} surfaces, where the Ge bonds are tensile-strained. A phase-field continuum model was developed to reproduce the morphological transformation and the Sn distribution within the wire, shedding light on the complex growth mechanism and unveiling the relation between segregation and faceting. The tunability of the photoluminescence emission with the change in composition and morphology of the GeSn shell highlights the potential of the core/shell nanowire system for optoelectronic devices operating at mid-infrared wavelengths.

Originele taal-2Engels
Pagina's (van-tot)2445-2455
Aantal pagina's11
TijdschriftACS Nano
Volume14
Nummer van het tijdschrift2
DOI's
StatusGepubliceerd - 25 feb. 2020

Financiering

The authors thank P. J. van Veldhoven for the technical support with the MOVPE reactor and L. Gagliano for the nanoimprint lithography of the Ge substrate. This work was supported by the Dutch Organization for Scientific Research (NWO-VICI 700.10.441) and by the Dutch Technology Foundation (STW 12744) and Philips Research. Solliance and the Dutch province of Noord-Brabant are acknowledged for funding the TEM facility. We acknowledge the CINECA award under the ISCRA initiative, for the availability of high-performance computing resources and support. A.D. acknowledges support from the NWO gravity program.

FinanciersFinanciernummer
CINECA
Dutch Organization for Scientific Research
NWO-VICI700.10.441
Nederlandse Organisatie voor Wetenschappelijk Onderzoek
STWSTW 12744

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