Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasma

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Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles and thermally driven processes for isotropic material removal. In this work, we extend the possibilities to obtain isotropic etching by introducing a plasma-based ALE process for ZnO which is radical-driven and utilizes acetylacetone (Hacac) and O2 plasma as reactants. In situ spectroscopic ellipsometry measurements indicate self-limiting half-reactions with etch rates ranging from 0.5 to 1.3 Å/cycle at temperatures between 100 and 250 °C. The ALE process was demonstrated on planar and three-dimensional substrates consisting of a regular array of semiconductor nanowires (NWs) conformally covered using atomic layer deposition of ZnO. Transmission electron microscopy studies conducted on the ZnO-covered NWs before and after ALE proved the isotropic nature and the damage-free characteristics of the process. In situ infrared spectroscopy measurements were used to elucidate the self-limiting nature of the ALE half-reactions and the reaction mechanism. During the Hacac etching reaction that is assumed to produce Zn(acac)2, carbonaceous species adsorbed on the ZnO surface are suggested as the cause of the self-limiting behavior. The subsequent O2 plasma step resets the surface for the next ALE cycle. High etch selectivities (80:1) over SiO2 and HfO2 were demonstrated. Preliminary results indicate that the etching process can be extended to other oxides such as Al2O3.

Originele taal-2Engels
Pagina's (van-tot)38588-38595
Aantal pagina's8
TijdschriftACS Applied Materials & Interfaces
Volume10
Nummer van het tijdschrift44
DOI's
StatusGepubliceerd - 7 nov 2018

Vingerafdruk

Etching
Plasmas
Nanowires
acetylacetone
Spectroscopic ellipsometry
Atomic layer deposition
Level control
Oxides
Infrared spectroscopy
Ions
Semiconductor materials
Transmission electron microscopy
Substrates

Citeer dit

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title = "Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasma",
abstract = "Atomic layer etching (ALE) provides {\AA}ngstr{\"o}m-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles and thermally driven processes for isotropic material removal. In this work, we extend the possibilities to obtain isotropic etching by introducing a plasma-based ALE process for ZnO which is radical-driven and utilizes acetylacetone (Hacac) and O2 plasma as reactants. In situ spectroscopic ellipsometry measurements indicate self-limiting half-reactions with etch rates ranging from 0.5 to 1.3 {\AA}/cycle at temperatures between 100 and 250 °C. The ALE process was demonstrated on planar and three-dimensional substrates consisting of a regular array of semiconductor nanowires (NWs) conformally covered using atomic layer deposition of ZnO. Transmission electron microscopy studies conducted on the ZnO-covered NWs before and after ALE proved the isotropic nature and the damage-free characteristics of the process. In situ infrared spectroscopy measurements were used to elucidate the self-limiting nature of the ALE half-reactions and the reaction mechanism. During the Hacac etching reaction that is assumed to produce Zn(acac)2, carbonaceous species adsorbed on the ZnO surface are suggested as the cause of the self-limiting behavior. The subsequent O2 plasma step resets the surface for the next ALE cycle. High etch selectivities (80:1) over SiO2 and HfO2 were demonstrated. Preliminary results indicate that the etching process can be extended to other oxides such as Al2O3.",
keywords = "atomic layer etching, isotropic removal, nanowires, plasma etching, ZnO",
author = "A. Mameli and Verheijen, {M. A.} and Mackus, {A. J.M.} and Kessels, {W. M.M.} and F. Roozeboom",
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month = "11",
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language = "English",
volume = "10",
pages = "38588--38595",
journal = "ACS Applied Materials & Interfaces",
issn = "1944-8244",
publisher = "American Chemical Society",
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Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasma. / Mameli, A.; Verheijen, M. A.; Mackus, A. J.M.; Kessels, W. M.M.; Roozeboom, F.

In: ACS Applied Materials & Interfaces, Vol. 10, Nr. 44, 07.11.2018, blz. 38588-38595.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasma

AU - Mameli, A.

AU - Verheijen, M. A.

AU - Mackus, A. J.M.

AU - Kessels, W. M.M.

AU - Roozeboom, F.

PY - 2018/11/7

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N2 - Atomic layer etching (ALE) provides Ångström-level control over material removal and holds potential for addressing the challenges in nanomanufacturing faced by conventional etching techniques. Recent research has led to the development of two main classes of ALE: ion-driven plasma processes yielding anisotropic (or directional) etch profiles and thermally driven processes for isotropic material removal. In this work, we extend the possibilities to obtain isotropic etching by introducing a plasma-based ALE process for ZnO which is radical-driven and utilizes acetylacetone (Hacac) and O2 plasma as reactants. In situ spectroscopic ellipsometry measurements indicate self-limiting half-reactions with etch rates ranging from 0.5 to 1.3 Å/cycle at temperatures between 100 and 250 °C. The ALE process was demonstrated on planar and three-dimensional substrates consisting of a regular array of semiconductor nanowires (NWs) conformally covered using atomic layer deposition of ZnO. Transmission electron microscopy studies conducted on the ZnO-covered NWs before and after ALE proved the isotropic nature and the damage-free characteristics of the process. In situ infrared spectroscopy measurements were used to elucidate the self-limiting nature of the ALE half-reactions and the reaction mechanism. During the Hacac etching reaction that is assumed to produce Zn(acac)2, carbonaceous species adsorbed on the ZnO surface are suggested as the cause of the self-limiting behavior. The subsequent O2 plasma step resets the surface for the next ALE cycle. High etch selectivities (80:1) over SiO2 and HfO2 were demonstrated. Preliminary results indicate that the etching process can be extended to other oxides such as Al2O3.

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KW - atomic layer etching

KW - isotropic removal

KW - nanowires

KW - plasma etching

KW - ZnO

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