Irradiance models for projection optics

R.W.H. Merks, Michel Habets, Siep Weiland, Wim Coene

Onderzoeksoutput: Bijdrage aan congresOtherAcademic

Samenvatting

Thermally induced deformations of optical elements influence the performance of high precision optical projection systems. For extreme ultraviolet (EUV) lithography, the mirrors each absorb approximately 35% of the incident power. The thermally induced deformations are for this reason mainly a result of the irradiance on the mirrors. Measuring the temperature distribution and/or the deformations of the mirrors is impractical. In order to determine and predict the induced deformations for design as well as control purposes irradiance models can be utilized.

Propagation of light can be simulated using ray tracing. A full ray tracing approach could be used to determine the irradiance on the elements accurately, but this approach requires hours of calculation time. In this presentation faster
approaches are proposed and compared to full ray tracing.
Originele taal-2Engels
Aantal pagina's1
StatusGepubliceerd - 2015
Evenement34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium - Center Parcs "De Vossemeren", Lommel, België
Duur: 24 mrt 201526 mrt 2015
http://www.beneluxmeeting.nl/2015/

Congres

Congres34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium
LandBelgië
StadLommel
Periode24/03/1526/03/15
AnderBenelux Meeting
Internet adres

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  • Citeer dit

    Merks, R. W. H., Habets, M., Weiland, S., & Coene, W. (2015). Irradiance models for projection optics. 34th Benelux Meeting on Systems and Control, March 24-26, 2015, Lommel, Belgium, Lommel, België.