Ion-radical synergy in HfO2 etching studied in a beam experiment

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

Originele taal-2	Engels
Titel	Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book
Plaats van productie	S.l.
Uitgeverij	s.n.
Status	Gepubliceerd - 2007

Citeer dit

@inproceedings{24fe6a340913436bbe04296b19e40885,

title = "Ion-radical synergy in HfO2 etching studied in a beam experiment",

author = "P.M. Gevers and H.C.W. Beijerinck and {Sanden, van de}, M.C.M. and W.M.M. Kessels",

year = "2007",

language = "English",

booktitle = "Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book",

publisher = "s.n.",

}

Ion-radical synergy in HfO2 etching studied in a beam experiment. / Gevers, P.M.; Beijerinck, H.C.W.; Sanden, van de, M.C.M. et al.
Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book. S.l.: s.n., 2007.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic

TY - GEN

T1 - Ion-radical synergy in HfO2 etching studied in a beam experiment

AU - Gevers, P.M.

AU - Beijerinck, H.C.W.

AU - Sanden, van de, M.C.M.

AU - Kessels, W.M.M.

PY - 2007

Y1 - 2007

M3 - Conference contribution

BT - Plasma Etch and Strip in Microelectronics 1st International Symposium (PESM), 10-11 September, 2007, Leuven, Belgium : Abstract Book

PB - s.n.

CY - S.l.

ER -