Investigation of “fur-like” residues post dry etching of polyimide using aluminum hard etch mask

S. Joshi, A. Savov, S. Shafqat, R. Dekker

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3 Citaten (Scopus)
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Samenvatting

The authors found that oxygen plasma etching of polyimide (PI) with aluminum (Al) as a hard-etch mask results in lightly textured arbitrary shaped “fur-like” residues. Upon investigation, the presence of Al was detected in these residues. Ruling out several causes of metal contamination that were already reported in literature, a new theory for the presence of the metal containing residues is described. Furthermore, different methods for the residue free etching of PI using an Al hard-etch by using different metal deposition and patterning methods are explored. A fur-free procedure for the etching of PI using a one step-reactive ion etch of the metal hard-etch mask is presented.

Originele taal-2Engels
Pagina's (van-tot)130-135
Aantal pagina's6
TijdschriftMaterials Science in Semiconductor Processing
Volume75
DOI's
StatusGepubliceerd - 1 mrt 2018

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