Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra

T.A.R. Hansen, P.G.J. Colsters, M.C.M. Sanden, van de, R.A.H. Engeln

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

1 Downloads (Pure)

Uittreksel

The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbon and graphite etching are investigated via time and spatially resolved measurements of the ion density and CH emission. A convolution of the ion and hydrocarbon density shows the importance of charge transfer in the plasma chemistry which ultimately yields the CH emission. The spatially resolved measurements clearly visualize the plasma expansion in the reactor and its deflection on a substrate. A stagnation zone is furthermore formed in front of a substrate when placed inside an expanding thermal plasma. An increased ion density further upstream from the substrate is attributed to a reorganization of the gas recirculation cells in the background of the reactor. The movement of a shutter in and out of the plasma expansion likewise affects these recirculation cells. This movement consequently redirects the energy flow to and from the background, as is deduced from the variation in rotational temperature of the CH radical.
Originele taal-2Engels
Artikelnummer355205
Pagina's (van-tot)355205-1/11
TijdschriftJournal of Physics D: Applied Physics
Volume44
Nummer van het tijdschrift35
DOI's
StatusGepubliceerd - 2011

Vingerafdruk

Plasma Gases
thermal plasmas
plasma chemistry
emission spectra
reactors
methylidyne
chemistry
Plasmas
Ions
expansion
shutters
cells
convolution integrals
Substrates
upstream
gas flow
deflection
graphite
hydrocarbons
charge transfer

Citeer dit

@article{e449c29b67494c1ea10ac31949d622d3,
title = "Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra",
abstract = "The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbon and graphite etching are investigated via time and spatially resolved measurements of the ion density and CH emission. A convolution of the ion and hydrocarbon density shows the importance of charge transfer in the plasma chemistry which ultimately yields the CH emission. The spatially resolved measurements clearly visualize the plasma expansion in the reactor and its deflection on a substrate. A stagnation zone is furthermore formed in front of a substrate when placed inside an expanding thermal plasma. An increased ion density further upstream from the substrate is attributed to a reorganization of the gas recirculation cells in the background of the reactor. The movement of a shutter in and out of the plasma expansion likewise affects these recirculation cells. This movement consequently redirects the energy flow to and from the background, as is deduced from the variation in rotational temperature of the CH radical.",
author = "T.A.R. Hansen and P.G.J. Colsters and {Sanden, van de}, M.C.M. and R.A.H. Engeln",
year = "2011",
doi = "10.1088/0022-3727/44/35/355205",
language = "English",
volume = "44",
pages = "355205--1/11",
journal = "Journal of Physics D: Applied Physics",
issn = "0022-3727",
publisher = "Institute of Physics",
number = "35",

}

Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra. / Hansen, T.A.R.; Colsters, P.G.J.; Sanden, van de, M.C.M.; Engeln, R.A.H.

In: Journal of Physics D: Applied Physics, Vol. 44, Nr. 35, 355205, 2011, blz. 355205-1/11.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - Investigating the flow dynamics and chemistry of an expanding thermal plasma through CH(A-X) emission spectra

AU - Hansen, T.A.R.

AU - Colsters, P.G.J.

AU - Sanden, van de, M.C.M.

AU - Engeln, R.A.H.

PY - 2011

Y1 - 2011

N2 - The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbon and graphite etching are investigated via time and spatially resolved measurements of the ion density and CH emission. A convolution of the ion and hydrocarbon density shows the importance of charge transfer in the plasma chemistry which ultimately yields the CH emission. The spatially resolved measurements clearly visualize the plasma expansion in the reactor and its deflection on a substrate. A stagnation zone is furthermore formed in front of a substrate when placed inside an expanding thermal plasma. An increased ion density further upstream from the substrate is attributed to a reorganization of the gas recirculation cells in the background of the reactor. The movement of a shutter in and out of the plasma expansion likewise affects these recirculation cells. This movement consequently redirects the energy flow to and from the background, as is deduced from the variation in rotational temperature of the CH radical.

AB - The gas flow in a linear plasma reactor and the plasma chemistry during hydrogenated amorphous carbon and graphite etching are investigated via time and spatially resolved measurements of the ion density and CH emission. A convolution of the ion and hydrocarbon density shows the importance of charge transfer in the plasma chemistry which ultimately yields the CH emission. The spatially resolved measurements clearly visualize the plasma expansion in the reactor and its deflection on a substrate. A stagnation zone is furthermore formed in front of a substrate when placed inside an expanding thermal plasma. An increased ion density further upstream from the substrate is attributed to a reorganization of the gas recirculation cells in the background of the reactor. The movement of a shutter in and out of the plasma expansion likewise affects these recirculation cells. This movement consequently redirects the energy flow to and from the background, as is deduced from the variation in rotational temperature of the CH radical.

U2 - 10.1088/0022-3727/44/35/355205

DO - 10.1088/0022-3727/44/35/355205

M3 - Article

VL - 44

SP - 355205-1/11

JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

SN - 0022-3727

IS - 35

M1 - 355205

ER -