Infrared and optical emission spectroscopy study of the surface chemistry in atmospheric-pressure plasma-enhanced spatial ALD of Al2O3

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Uittreksel

Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-throughput technique used to deposit thin films at low temperatures on large-area substrates. The spatial separation of the ALD half-reactions and the use of an atmospheric-pressure plasma in the co-reactant step give rise to a complex surface chemistry which to date is not well understood. In this study, we employed gas-phase infrared spectroscopy and optical emission spectroscopy (OES) to unravel the underlying chemistry of the PE-s-ALD process for Al2O3 films grown at 80 °C using Al(CH3)3 as the precursor and Ar-O2 plasma as the co-reactant. We identified the reaction products generated at various exposure times of the substrate to the precursor. Infrared absorbance spectra show CO, CO2, H2O and CH4 as the main reaction by-products formed from a) combustion-like reactions of the methylated substrate surface with oxygen radicals and O3 species, and b) H2O molecules either residual or formed in the process that give rise to a concurrent latent thermal ALD component. In addition, CH2O and CH3OH were identified as reaction by-products formed either at the substrate surface or in the plasma. The OES spectra confirmed the combustive nature of the PE-s-ALD reactions as shown by the OH and CH emission peaks that appeared during the spatial ALD process while excited O-species are being consumed.
Originele taal-2Engels
Pagina's (van-tot)35-44
Aantal pagina's10
TijdschriftECS Transactions
Volume92
Nummer van het tijdschrift3
DOI's
StatusGepubliceerd - 2019

Vingerafdruk

Optical emission spectroscopy
Surface chemistry
Atmospheric pressure
Infrared radiation
Plasmas
Atomic layer deposition
Substrates
Byproducts
Reaction products
Infrared spectroscopy
Deposits
Throughput
Thin films
Molecules
Oxygen
Gases

Citeer dit

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title = "Infrared and optical emission spectroscopy study of the surface chemistry in atmospheric-pressure plasma-enhanced spatial ALD of Al2O3",
abstract = "Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-throughput technique used to deposit thin films at low temperatures on large-area substrates. The spatial separation of the ALD half-reactions and the use of an atmospheric-pressure plasma in the co-reactant step give rise to a complex surface chemistry which to date is not well understood. In this study, we employed gas-phase infrared spectroscopy and optical emission spectroscopy (OES) to unravel the underlying chemistry of the PE-s-ALD process for Al2O3 films grown at 80 °C using Al(CH3)3 as the precursor and Ar-O2 plasma as the co-reactant. We identified the reaction products generated at various exposure times of the substrate to the precursor. Infrared absorbance spectra show CO, CO2, H2O and CH4 as the main reaction by-products formed from a) combustion-like reactions of the methylated substrate surface with oxygen radicals and O3 species, and b) H2O molecules either residual or formed in the process that give rise to a concurrent latent thermal ALD component. In addition, CH2O and CH3OH were identified as reaction by-products formed either at the substrate surface or in the plasma. The OES spectra confirmed the combustive nature of the PE-s-ALD reactions as shown by the OH and CH emission peaks that appeared during the spatial ALD process while excited O-species are being consumed.",
author = "Maria Mione and Richard Engeln and Vincent Vandalon and Erwin Kessels and Fred Roozeboom",
year = "2019",
doi = "10.1149/09203.0035ecst",
language = "English",
volume = "92",
pages = "35--44",
journal = "ECS Transactions",
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publisher = "Electrochemical Society, Inc.",
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T1 - Infrared and optical emission spectroscopy study of the surface chemistry in atmospheric-pressure plasma-enhanced spatial ALD of Al2O3

AU - Mione, Maria

AU - Engeln, Richard

AU - Vandalon, Vincent

AU - Kessels, Erwin

AU - Roozeboom, Fred

PY - 2019

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N2 - Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-throughput technique used to deposit thin films at low temperatures on large-area substrates. The spatial separation of the ALD half-reactions and the use of an atmospheric-pressure plasma in the co-reactant step give rise to a complex surface chemistry which to date is not well understood. In this study, we employed gas-phase infrared spectroscopy and optical emission spectroscopy (OES) to unravel the underlying chemistry of the PE-s-ALD process for Al2O3 films grown at 80 °C using Al(CH3)3 as the precursor and Ar-O2 plasma as the co-reactant. We identified the reaction products generated at various exposure times of the substrate to the precursor. Infrared absorbance spectra show CO, CO2, H2O and CH4 as the main reaction by-products formed from a) combustion-like reactions of the methylated substrate surface with oxygen radicals and O3 species, and b) H2O molecules either residual or formed in the process that give rise to a concurrent latent thermal ALD component. In addition, CH2O and CH3OH were identified as reaction by-products formed either at the substrate surface or in the plasma. The OES spectra confirmed the combustive nature of the PE-s-ALD reactions as shown by the OH and CH emission peaks that appeared during the spatial ALD process while excited O-species are being consumed.

AB - Atmospheric-pressure plasma-enhanced spatial atomic layer deposition (PE-s-ALD) is an emerging high-throughput technique used to deposit thin films at low temperatures on large-area substrates. The spatial separation of the ALD half-reactions and the use of an atmospheric-pressure plasma in the co-reactant step give rise to a complex surface chemistry which to date is not well understood. In this study, we employed gas-phase infrared spectroscopy and optical emission spectroscopy (OES) to unravel the underlying chemistry of the PE-s-ALD process for Al2O3 films grown at 80 °C using Al(CH3)3 as the precursor and Ar-O2 plasma as the co-reactant. We identified the reaction products generated at various exposure times of the substrate to the precursor. Infrared absorbance spectra show CO, CO2, H2O and CH4 as the main reaction by-products formed from a) combustion-like reactions of the methylated substrate surface with oxygen radicals and O3 species, and b) H2O molecules either residual or formed in the process that give rise to a concurrent latent thermal ALD component. In addition, CH2O and CH3OH were identified as reaction by-products formed either at the substrate surface or in the plasma. The OES spectra confirmed the combustive nature of the PE-s-ALD reactions as shown by the OH and CH emission peaks that appeared during the spatial ALD process while excited O-species are being consumed.

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