Influence of ICP etching on surface morphology of InP substrates

F. Karouta, E.J. Geluk, R.W. Heijden, van der, T.J. Eijkemans, A.Y. Silov, J.J.G.M. Tol, van der, M.K. Smit, H.W.M. Salemink

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Samenvatting

We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.
Originele taal-2Engels
TitelProc. 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004
Plaats van productieKagoshima, Japan
Pagina's322-325
DOI's
StatusGepubliceerd - 2004
Evenement16th International Conference on Indium Phosphide and Related Materials (IPRM 2004) - Kagoshima, Japan
Duur: 1 jan 2004 → …
Congresnummer: 16

Congres

Congres16th International Conference on Indium Phosphide and Related Materials (IPRM 2004)
Verkorte titelIPRM 2004
LandJapan
StadKagoshima
Periode1/01/04 → …
Ander16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004

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    Karouta, F., Geluk, E. J., Heijden, van der, R. W., Eijkemans, T. J., Silov, A. Y., Tol, van der, J. J. G. M., Smit, M. K., & Salemink, H. W. M. (2004). Influence of ICP etching on surface morphology of InP substrates. In Proc. 16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004 (blz. 322-325). https://doi.org/10.1109/ICIPRM.2004.1442720