Influence of ICP etching on surface morphology of InP substrates

F. Karouta, E.J. Geluk, R.W. Heijden, van der, T.J. Eijkemans, A.Y. Silov, J.J.G.M. Tol, van der, M.K. Smit, H.W.M. Salemink

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

3 Citaten (Scopus)
3 Downloads (Pure)

Samenvatting

We have investigated the effect of Inductively Coupled Plasma (ICP) etching using a C12-CHrH2 chemistry on the surface morphology of InP substrates. We have observed a strong dependence of the surface morphology on the etching times of semi-insulating ( s i ) InP-wafers. Pillars are formed after a sufficient etching time. Photoluminescence characterization revealed a strong correlation between morphology and PL signal intensity.
Originele taal-2Engels
Titel16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004, 31 May - 4 June 2004
Plaats van productieKagoshima, Japan
Pagina's322-325
Aantal pagina's4
DOI's
StatusGepubliceerd - 2004
Evenement16th International Conference on Indium Phosphide and Related Materials (IPRM 2004) - Kagoshima, Japan
Duur: 1 jan. 2004 → …
Congresnummer: 16

Congres

Congres16th International Conference on Indium Phosphide and Related Materials (IPRM 2004)
Verkorte titelIPRM 2004
Land/RegioJapan
StadKagoshima
Periode1/01/04 → …
Ander16th Intern. Conf. on Indium Phosphide and Related Materials (IPRM) 2004

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