In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching

G.M.W. Kroesen, C.J. Timmermans, F.J. Hoog, de, C.J.H. de Zeeuw, D.C. Schram

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Originele taal-2Engels
TitelISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1
RedacteurenK. Akashi, A. Kinbara
Plaats van productieTokyo
Pagina's525-530
StatusGepubliceerd - 1987
Evenement8th International Symposium on Plasma Chemistry (ISPC 8) - Tokyo, Japan
Duur: 31 aug 19874 sep 1987
Congresnummer: 8

Congres

Congres8th International Symposium on Plasma Chemistry (ISPC 8)
Verkorte titelISPC/Tokyo 1987
LandJapan
StadTokyo
Periode31/08/874/09/87

Citeer dit

Kroesen, G. M. W., Timmermans, C. J., Hoog, de, F. J., de Zeeuw, C. J. H., & Schram, D. C. (1987). In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. In K. Akashi, & A. Kinbara (editors), ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1 (blz. 525-530). Tokyo.
Kroesen, G.M.W. ; Timmermans, C.J. ; Hoog, de, F.J. ; de Zeeuw, C.J.H. ; Schram, D.C. / In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1. redacteur / K. Akashi ; A. Kinbara. Tokyo, 1987. blz. 525-530
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title = "In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching",
author = "G.M.W. Kroesen and C.J. Timmermans and {Hoog, de}, F.J. and {de Zeeuw}, C.J.H. and D.C. Schram",
year = "1987",
language = "English",
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Kroesen, GMW, Timmermans, CJ, Hoog, de, FJ, de Zeeuw, CJH & Schram, DC 1987, In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. in K Akashi & A Kinbara (redactie), ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1. Tokyo, blz. 525-530, 8th International Symposium on Plasma Chemistry (ISPC 8), Tokyo, Japan, 31/08/87.

In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. / Kroesen, G.M.W.; Timmermans, C.J.; Hoog, de, F.J.; de Zeeuw, C.J.H.; Schram, D.C.

ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1. redactie / K. Akashi; A. Kinbara. Tokyo, 1987. blz. 525-530.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademic

TY - GEN

T1 - In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching

AU - Kroesen, G.M.W.

AU - Timmermans, C.J.

AU - Hoog, de, F.J.

AU - de Zeeuw, C.J.H.

AU - Schram, D.C.

PY - 1987

Y1 - 1987

M3 - Conference contribution

SP - 525

EP - 530

BT - ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1

A2 - Akashi, K.

A2 - Kinbara, A.

CY - Tokyo

ER -

Kroesen GMW, Timmermans CJ, Hoog, de FJ, de Zeeuw CJH, Schram DC. In situ ellipsometry : an accurate analysis of films during plasma deposition and plasma etching. In Akashi K, Kinbara A, redacteurs, ISPC 8 : International symposium on plasma chemistry, Tokyo, August 31 - September 4, 1987, vol. 1. Tokyo. 1987. blz. 525-530