High resolution photolithography for direct view active matrix organic light-emitting diode augmented reality displays

Paweł E. Malinowski, Tung Huei Ke, Atsushi Nakamura, Ya Han Liu, Dieter Vander Velpen, Erwin Vandenplas, Nikolas Papadopoulos, Auke Jisk Kronemeijer, Jan Laurens van der Steen, Soeren Steudel, Che Cheng Kuo, Yen Yu Huang, Yu Hsien Chen, Ming Hua Yeh, Gerwin Gelinck, Paul Heremans

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

29 Citaten (Scopus)

Samenvatting

High-resolution RGB organic light-emitting diode frontplane is a key enabler for direct-view transparent augmented reality displays. In this paper, we demonstrate 1250 ppi passive displays and semi-transparent active displays. Organic light-emitting diode photolithography can provide pixel density above 1000 ppi while keeping effective emission area high because of high aperture ratio. Patterns with 2 μm line pitch were successfully transferred to emission layers, indicating possible further pixel density scaling. Lifetime after patterning, key parameter enabling industrialization, is above 150 h (T90 at 1000 nit).

Originele taal-2Engels
Pagina's (van-tot)128-136
Aantal pagina's9
TijdschriftJournal of the Society for Information Display
Volume26
Nummer van het tijdschrift3
DOI's
StatusGepubliceerd - 1 mrt. 2018

Financiering

This work has been carried out in the framework of Holst Centre, an open innovation platform created by IMEC and TNO. The authors would like to thank the process engineers of Holst Centre’s GEN1 TFT Pilot Line for fabrication of the IGZO display backplanes used here.

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