High rate deposition of thin films: Expanding thermal plasma deposition technology

Onderzoeksoutput: Bijdrage aan congresOtherAcademic

Originele taal-2Engels
StatusGepubliceerd - 2006
Evenementconference; Advanced Core Technology Laboratory, FujiFilm; 2006-01-23; 2006-01-23 -
Duur: 23 jan 200623 jan 2006

Congres

Congresconference; Advanced Core Technology Laboratory, FujiFilm; 2006-01-23; 2006-01-23
Periode23/01/0623/01/06
AnderAdvanced Core Technology Laboratory, FujiFilm

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