High-rate deposition of hydrogenated nanocrystalline silicon with an expanding thermal plasma

K. Nadir, B. Hoex, P.J. Oever, van den, W.M.M. Kessels, M.C.M. Sanden, van de

Onderzoeksoutput: Bijdrage aan congresPoster

Samenvatting

No abstract
Originele taal-2Engels
Pagina'sB 8-
StatusGepubliceerd - 2006
Evenement18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands - Lunteren, Nederland
Duur: 22 mrt. 200623 mrt. 2006

Congres

Congres18th NNV/CPS Symposium on Plasma Physics and Radiation Technology, March 22-23, 2006, Lunteren, The Netherlands
Land/RegioNederland
StadLunteren
Periode22/03/0623/03/06
Ander18th Symposium Plasma Physics and Radiation Technology, 22-23 March 2006, Lunteren, The Netherlands

Bibliografische nota

18th symposium plasma physics and radiation technology : March 22-23, 2006, Lunteren : programme and abstracts

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