Heat conduction characteristic of rarefied gas in nanochannel

R. Rabani, G. Heidarinejad (Corresponding author), J. Harting, E. Shirani

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

Uittreksel

Nonequilibrium molecular dynamics simulations is applied to investigate the simultaneous effect of rarefaction and wall force field on the heat conduction characteristics of nano-confined rarefied argon gas. The interactive thermal wall model is used to specify the desired temperature on the walls while the Irving– Kirkwood expression is implemented for calculating the heat flux. It is observed that as the temperature differences between the walls increases by lowering the temperature of the cold wall, the number of adsorbed gas atoms on the cold wall increases notably due to the increment in the residence time of the gas atoms. Consequently, the interfacial thermal resistance between the gas and the cold wall reduces which results in a reduction of the temperature jump. Meanwhile, the increase in the temperature of the hot wall leads to a reduction of the residence time of gas atoms in the near-wall region which decreases the number of absorbed gas atoms on the hot wall. This results in an increase in interfacial thermal resistance which leads to a higher temperature jump. It is observed that the bulk, wall force field and interface regions form approximately 10%, 45% and 45% of the total thermal resistance, respectively. Furthermore, unlike the interfacial thermal resistance, the bulk and the wall force field thermal resistance are approximately independent of the implemented temperature difference.
Originele taal-2Engels
Pagina's (van-tot)1-13
Aantal pagina's13
TijdschriftJournal of Applied Fluid Mechanics
Volume13
Nummer van het tijdschrift1
DOI's
StatusGepubliceerd - jan 2020

Citeer dit

Rabani, R. ; Heidarinejad, G. ; Harting, J. ; Shirani, E. / Heat conduction characteristic of rarefied gas in nanochannel. In: Journal of Applied Fluid Mechanics. 2020 ; Vol. 13, Nr. 1. blz. 1-13.
@article{1544c708ab384b97b4e949f97a742054,
title = "Heat conduction characteristic of rarefied gas in nanochannel",
abstract = "Nonequilibrium molecular dynamics simulations is applied to investigate the simultaneous effect of rarefaction and wall force field on the heat conduction characteristics of nano-confined rarefied argon gas. The interactive thermal wall model is used to specify the desired temperature on the walls while the Irving– Kirkwood expression is implemented for calculating the heat flux. It is observed that as the temperature differences between the walls increases by lowering the temperature of the cold wall, the number of adsorbed gas atoms on the cold wall increases notably due to the increment in the residence time of the gas atoms. Consequently, the interfacial thermal resistance between the gas and the cold wall reduces which results in a reduction of the temperature jump. Meanwhile, the increase in the temperature of the hot wall leads to a reduction of the residence time of gas atoms in the near-wall region which decreases the number of absorbed gas atoms on the hot wall. This results in an increase in interfacial thermal resistance which leads to a higher temperature jump. It is observed that the bulk, wall force field and interface regions form approximately 10{\%}, 45{\%} and 45{\%} of the total thermal resistance, respectively. Furthermore, unlike the interfacial thermal resistance, the bulk and the wall force field thermal resistance are approximately independent of the implemented temperature difference.",
keywords = "Thermal resistance, Temperature jump, Gas atoms distribution, Molecular dynamics",
author = "R. Rabani and G. Heidarinejad and J. Harting and E. Shirani",
year = "2020",
month = "1",
doi = "10.29252/jafm.13.01.30075",
language = "English",
volume = "13",
pages = "1--13",
journal = "Journal of Applied Fluid Mechanics",
issn = "1735-3572",
publisher = "Isfahan University of Technology",
number = "1",

}

Heat conduction characteristic of rarefied gas in nanochannel. / Rabani, R.; Heidarinejad, G. (Corresponding author); Harting, J.; Shirani, E.

In: Journal of Applied Fluid Mechanics, Vol. 13, Nr. 1, 01.2020, blz. 1-13.

Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

TY - JOUR

T1 - Heat conduction characteristic of rarefied gas in nanochannel

AU - Rabani, R.

AU - Heidarinejad, G.

AU - Harting, J.

AU - Shirani, E.

PY - 2020/1

Y1 - 2020/1

N2 - Nonequilibrium molecular dynamics simulations is applied to investigate the simultaneous effect of rarefaction and wall force field on the heat conduction characteristics of nano-confined rarefied argon gas. The interactive thermal wall model is used to specify the desired temperature on the walls while the Irving– Kirkwood expression is implemented for calculating the heat flux. It is observed that as the temperature differences between the walls increases by lowering the temperature of the cold wall, the number of adsorbed gas atoms on the cold wall increases notably due to the increment in the residence time of the gas atoms. Consequently, the interfacial thermal resistance between the gas and the cold wall reduces which results in a reduction of the temperature jump. Meanwhile, the increase in the temperature of the hot wall leads to a reduction of the residence time of gas atoms in the near-wall region which decreases the number of absorbed gas atoms on the hot wall. This results in an increase in interfacial thermal resistance which leads to a higher temperature jump. It is observed that the bulk, wall force field and interface regions form approximately 10%, 45% and 45% of the total thermal resistance, respectively. Furthermore, unlike the interfacial thermal resistance, the bulk and the wall force field thermal resistance are approximately independent of the implemented temperature difference.

AB - Nonequilibrium molecular dynamics simulations is applied to investigate the simultaneous effect of rarefaction and wall force field on the heat conduction characteristics of nano-confined rarefied argon gas. The interactive thermal wall model is used to specify the desired temperature on the walls while the Irving– Kirkwood expression is implemented for calculating the heat flux. It is observed that as the temperature differences between the walls increases by lowering the temperature of the cold wall, the number of adsorbed gas atoms on the cold wall increases notably due to the increment in the residence time of the gas atoms. Consequently, the interfacial thermal resistance between the gas and the cold wall reduces which results in a reduction of the temperature jump. Meanwhile, the increase in the temperature of the hot wall leads to a reduction of the residence time of gas atoms in the near-wall region which decreases the number of absorbed gas atoms on the hot wall. This results in an increase in interfacial thermal resistance which leads to a higher temperature jump. It is observed that the bulk, wall force field and interface regions form approximately 10%, 45% and 45% of the total thermal resistance, respectively. Furthermore, unlike the interfacial thermal resistance, the bulk and the wall force field thermal resistance are approximately independent of the implemented temperature difference.

KW - Thermal resistance

KW - Temperature jump

KW - Gas atoms distribution

KW - Molecular dynamics

UR - http://www.scopus.com/inward/record.url?scp=85074260719&partnerID=8YFLogxK

U2 - 10.29252/jafm.13.01.30075

DO - 10.29252/jafm.13.01.30075

M3 - Article

VL - 13

SP - 1

EP - 13

JO - Journal of Applied Fluid Mechanics

JF - Journal of Applied Fluid Mechanics

SN - 1735-3572

IS - 1

ER -