Generic framework for photoresist-based metrology calibrations: redesign of calibration component and proof of the new architecture's feasability

ASML is a company that designs, develops and produces photolithography machines, called wafer scanners, used in the process of manufacturing chips and integrated circuits. In order to achieve this it requires nanometer accuracy at high speeds. For the nanometer accu-racy to be reached, the system must have a highly accurate calibration system. The calibra-tion is achieved both through hardware and software means. One part of this calibration process is the exposure of a test wafer, readout of the exposure results and adjustment of the machine's parameters. This sequence is executed repeatedly during the calibration phase. Test engineers need to be able to create new calibration tests for this sequence in a conven-ient way. This report describes the proposal for a new architecture of the exposure frame-work used by all the exposure calibration tests. Additionally, the process that drove this project is explained.