@inproceedings{f2e1c63b8bd84e62aeb7f5a3756619f7,
title = "General imaging of advanced 3D mask objects based on the fully-vectorial Extended Nijboer-Zernike (ENZ) theory",
abstract = "In this paper we introduce a new mask imaging algorithm that is based on the source point integration method (or Abbe method). The method presented here distinguishes itself from existing methods by exploiting the through-focus imaging feature of the Extended Nijboer-Zernike (ENZ) theory of diffraction. An introduction to ENZ-theory and its application in general imaging is provided after which we describe the mask imaging scheme that can be derived from it. The remainder of the paper is devoted to illustrating the advantages of the new method over existing methods (Hopkins-based). To this extent several simulation results are included that illustrate advantages arising from: the accurate incorporation of isolated structures, the rigorous treatment of the object (mask topography) and the fully vectorial through-focus image formation of the ENZ-based algorithm.",
author = "{Haver, van}, S. and O.T.A. Janssen and J.J.M. Braat and A.J.E.M. Janssen and H.P. Urbach and S.F. Pereira",
year = "2008",
doi = "10.1117/12.771872",
language = "English",
isbn = "9780819471093",
series = "Proceedings of SPIE",
publisher = "SPIE",
pages = "69240U--1/8",
booktitle = "Proceedings Optical Microlithography XXI, 26 - 29 February 2008, San Jose, California",
address = "United States",
}