Foundry photonic process extension with bandgap tuning using selective area growth

Florian Lemaitre, Catherine Fortin, Nadine Lagay, Guillaume Binet, Dzmitry Pustakhod, Jean Decobert, Huub Ambrosius, Kevin Williams

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The extension of a photonic integrated circuit foundry process flow is proposed by integrating selective area growth (SAG) to enable bandgap tuning for each individual active building block. The process adaptations and the impact on performance are reviewed in terms of morphology requirements and topology reduction. This platform extension enables bandgap tuning for a set of active devices to cover the wavelength range from 1453 to 1651 nm. Integration is demonstrated in combination with active-passive butt-joint technology to create the most comprehensive range of generic building blocks. Performance and limitations of the range of achievable band-edges within the same monolithic wafer are studied for amplifiers and extended cavity lasers.
Originele taal-2Engels
Aantal pagina's8
TijdschriftIEEE Journal of Selected Topics in Quantum Electronics
Nummer van het tijdschrift5
StatusGepubliceerd - 11 jun 2019


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