Formation of SiO2 buffer layer for LiNbO3 thin films growth

Z.E. Vakulov, V.S. Klimin, A.A. Rezvan, R.V. Tominov, K. Korzun, I.N. Kots, V.V. Polyakova, O.A. Ageev

Onderzoeksoutput: Bijdrage aan tijdschriftCongresartikelpeer review

5 Citaten (Scopus)
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Samenvatting

This paper shows the results of study of the effect of SiO2 buffer layer thickness on the morphological parameters of nanocrystalline LiNbO3 films formed by pulsed laser deposition. It has been established that with increasing in the thickness of SiO2 buffer layer from 10 nm to 50 nm, the roughness of LiNbO3 films decreases from 5.1 nm to 4.4 nm. The minimum value of the grain diameter (118 nm) corresponds to the thickness of the buffer layer equal to 50 nm. The results obtained can be used in the design and manufacture of integrated acousto-optic and piezoelectric devices, as well as sensitive elements of sensors using various effects of surface acoustic waves.

Originele taal-2Engels
Artikelnummer012042
Aantal pagina's5
TijdschriftJournal of Physics: Conference Series
Volume1410
Nummer van het tijdschrift1
DOI's
StatusGepubliceerd - 20 dec. 2019
Evenement6th International School and Conference on Optoelectronics, Photonics, Engineering and Nanostructures, SPbOPEN 2019 - Saint Petersburg, Rusland
Duur: 22 apr. 201925 apr. 2019

Bibliografische nota

Publisher Copyright:
© Published under licence by IOP Publishing Ltd.

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