Samenvatting
We present recent developments on flexible a-IGZO TFT technology scaling in terms of TFT channel length and operating voltage, as well as manufacturing cost optimization with a focus on R2R processing compatibility. We present progress on the relevant technology building blocks; (i) R2R compatible TFT architecture, (ii) (multilevel) nanoimprint lithography and (iii) S-ALD deposited TFT materials. Additionally, we show a developing application that drives scaling of the technology, namely a monolithically integrated flexible AMOLED display with in-display fingerprint detection.
| Originele taal-2 | Engels |
|---|---|
| Titel | AM-FPD 2018 - 25th International Workshop on Active-Matrix Flatpanel Displays and Devices |
| Subtitel | TFT Technologies and FPD Materials, Proceedings |
| Plaats van productie | Piscataway |
| Uitgeverij | Institute of Electrical and Electronics Engineers |
| Aantal pagina's | 4 |
| ISBN van geprinte versie | 9784990875350 |
| DOI's | |
| Status | Gepubliceerd - 2018 |
| Evenement | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 - Kyoto, Japan Duur: 3 jul. 2018 → 6 jul. 2018 |
Congres
| Congres | 25th International Workshop on Active-Matrix Flatpanel Displays and Devices - TFT Technologies and FPD Materials, AM-FPD 2018 |
|---|---|
| Land/Regio | Japan |
| Stad | Kyoto |
| Periode | 3/07/18 → 6/07/18 |
Financiering
This work was carried out in the frame of the Holst Centre, a joint collaboration between IMEC and TNO, and financed through the Flexlines project within the Interreg V-programme Flanders-The Netherlands, a cross-border cooperation programme with financial support from the European Regional Development Fund. We gratefully thank Fred Roozeboom and Andrea Illiberi with regards to the S-ALD work and the process engineers of Holst Centre’s GEN1 TFT Pilot Line in Eindhoven, the Netherlands, for fabrication of the transistors and TFT backplanes.
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