@inproceedings{1fa7906f911640308b91db1cc1cf4193,
title = "First performance results of the ASML alplia demo tool",
abstract = "The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.",
author = "Hans Meiling and Henk Meijer and Vadim Banine and Roel Moors and Regier Groeneveld and Voorma, \{Harm Jan\} and Uwe Mickan and Bas Wolschrijn and Bas Mertens and \{van Baars\}, Gregor and Peter K{\"u}rz and Noreen Harned",
year = "2006",
month = jul,
day = "10",
doi = "10.1117/12.657348",
language = "English",
isbn = "0819461946",
series = "Proceedings of SPIE",
publisher = "SPIE",
editor = "M. Lercel",
booktitle = "Emerging Lithographic Technologies X",
address = "United States",
note = "Emerging Lithographic Technologies X ; Conference date: 21-01-2006 Through 23-01-2006",
}