First performance results of the ASML alplia demo tool

Hans Meiling, Henk Meijer, Vadim Banine, Roel Moors, Regier Groeneveld, Harm Jan Voorma, Uwe Mickan, Bas Wolschrijn, Bas Mertens, Gregor van Baars, Peter Kürz, Noreen Harned

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

95 Citaten (Scopus)

Samenvatting

The ASML EUV alpha demo tool is operational! The alpha demo tool is a 0.25NA fully functional lithography tool with a field size of 26×33 mm2, enabling process development at the 40-nm technology node. In this paper we describe the tool performance, show that vacuum is achieved in a few hours, and demonstrate that our optics contamination strategy mitigates degradation of the optics. Additional data shows the Sn source cost-of-ownership to be comparable to state-of-the-art ArF source systems, by implementing a collector contamination mitigation strategy that includes cleaning. And, we present our first 35-nm dense lines and spaces (half pitch) resist images.

Originele taal-2Engels
TitelEmerging Lithographic Technologies X
RedacteurenM. Lercel
UitgeverijSPIE
Aantal pagina's12
ISBN van geprinte versie0819461946, 9780819461940
DOI's
StatusGepubliceerd - 10 jul. 2006
Extern gepubliceerdJa
EvenementEmerging Lithographic Technologies X - San Jose, CA, Verenigde Staten van Amerika
Duur: 21 jan. 200623 jan. 2006

Publicatie series

NaamProceedings of SPIE
Volume6151

Congres

CongresEmerging Lithographic Technologies X
Land/RegioVerenigde Staten van Amerika
StadSan Jose, CA
Periode21/01/0623/01/06

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