Field strengths and dissipated powers in microwave-excited high-pressure sulphur discharges

M. van Dongen; A. Körber; H.W.P. Heijden, van der; J. Jonkers; R. Scholl; J.J.A.M. Mullen, van der

doi:10.1088/0022-3727/31/21/015

Field strengths and dissipated powers in microwave-excited high-pressure sulphur discharges

M. van Dongen
, A. Körber
, H.W.P. Heijden, van der
, J. Jonkers
, R. Scholl
, J.J.A.M. Mullen, van der

Plasma & Materials Processing

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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A method which makes it is possible to measure the electric field strength in microwave discharges is presented. A condition for this method is that the plasma has such a low conductivity that the associated skin depth is larger than the discharge radius. It is found that the field strength in high-pressure sulphur lamps is around 400 V . Furthermore, this method allows the determination of the power absorbed in the resonator's wall and in the plasma and the estimation of the effective electric conductivity in the discharge.

Originele taal-2	Engels
Pagina's (van-tot)	3095-3101
Aantal pagina's	7
Tijdschrift	Journal of Physics D: Applied Physics
Volume	31
Nummer van het tijdschrift	21
DOI's	https://doi.org/10.1088/0022-3727/31/21/015
Status	Gepubliceerd - 1998

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10.1088/0022-3727/31/21/015

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title = "Field strengths and dissipated powers in microwave-excited high-pressure sulphur discharges",

abstract = "A method which makes it is possible to measure the electric field strength in microwave discharges is presented. A condition for this method is that the plasma has such a low conductivity that the associated skin depth is larger than the discharge radius. It is found that the field strength in high-pressure sulphur lamps is around 400 V . Furthermore, this method allows the determination of the power absorbed in the resonator's wall and in the plasma and the estimation of the effective electric conductivity in the discharge.",

author = "\{van Dongen\}, M. and A. K{\"o}rber and \{Heijden, van der\}, H.W.P. and J. Jonkers and R. Scholl and \{Mullen, van der\}, J.J.A.M.",

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AU - van Dongen, M.

AU - Körber, A.

AU - Heijden, van der, H.W.P.

AU - Jonkers, J.

AU - Scholl, R.

AU - Mullen, van der, J.J.A.M.

PY - 1998

Y1 - 1998

N2 - A method which makes it is possible to measure the electric field strength in microwave discharges is presented. A condition for this method is that the plasma has such a low conductivity that the associated skin depth is larger than the discharge radius. It is found that the field strength in high-pressure sulphur lamps is around 400 V . Furthermore, this method allows the determination of the power absorbed in the resonator's wall and in the plasma and the estimation of the effective electric conductivity in the discharge.

AB - A method which makes it is possible to measure the electric field strength in microwave discharges is presented. A condition for this method is that the plasma has such a low conductivity that the associated skin depth is larger than the discharge radius. It is found that the field strength in high-pressure sulphur lamps is around 400 V . Furthermore, this method allows the determination of the power absorbed in the resonator's wall and in the plasma and the estimation of the effective electric conductivity in the discharge.

U2 - 10.1088/0022-3727/31/21/015

DO - 10.1088/0022-3727/31/21/015

M3 - Article

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JO - Journal of Physics D: Applied Physics

JF - Journal of Physics D: Applied Physics

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ER -

Field strengths and dissipated powers in microwave-excited high-pressure sulphur discharges

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