Fast isotropic etching of photoresist and silicon using an expanding thermal plasma

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Originele taal-2	Engels
Titel	AVS, American Vacuum Society : 44th national symposium, San Jose, October 20-24, 1997 : Abstracts
Pagina's	73
Status	Gepubliceerd - 1997

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@inproceedings{fefa07a5363c4c148c6bf25d5dae9d69,

title = "Fast isotropic etching of photoresist and silicon using an expanding thermal plasma",

author = "\{Sanden, van de\}, M.C.M. and \{Straaten, van der\}, O. and D.C. Schram",

year = "1997",

language = "English",

pages = "73",

booktitle = "AVS, American Vacuum Society : 44th national symposium, San Jose, October 20-24, 1997 : Abstracts",

}