Fabrication and characterization of a wet-etched InP-based vertical coupling mirror

R.M. Lemos Alvares Dos Santos; D. D'Agostino; F.M. Soares; H. Rabbani Haghighi; M.K. Smit; X.J.M. Leijtens

Fabrication and characterization of a wet-etched InP-based vertical coupling mirror

R.M. Lemos Alvares Dos Santos, D. D'Agostino, F.M. Soares, H. Rabbani Haghighi, M.K. Smit, X.J.M. Leijtens

Photonic Integration

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In this work we describe the fabrication and characterization of couplers realized with a wet etching process that is compatible with the standard COBRA active-passive process. The implementation of this broadband structure allows for wafer-scale waveguide-loss and absolute-wavelength measurements.

Originele taal-2	Engels
Titel	Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven
Redacteuren	X.J.M. Leijtens, D. Pustakhod
Plaats van productie	Eindhoven
Uitgeverij	Technische Universiteit Eindhoven
Pagina's	179-182
ISBN van geprinte versie	978-90-386-3512-5
Status	Gepubliceerd - 2013

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Lemos Alvares Dos Santos, R. M., D'Agostino, D., Soares, F. M., Rabbani Haghighi, H., Smit, M. K., & Leijtens, X. J. M. (2013). Fabrication and characterization of a wet-etched InP-based vertical coupling mirror. In X. J. M. Leijtens, & D. Pustakhod (editors), Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven (blz. 179-182). Technische Universiteit Eindhoven.

Lemos Alvares Dos Santos, R.M. ; D'Agostino, D. ; Soares, F.M. et al. / Fabrication and characterization of a wet-etched InP-based vertical coupling mirror. Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven. redacteur / X.J.M. Leijtens ; D. Pustakhod. Eindhoven : Technische Universiteit Eindhoven, 2013. blz. 179-182

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title = "Fabrication and characterization of a wet-etched InP-based vertical coupling mirror",

abstract = "In this work we describe the fabrication and characterization of couplers realized with a wet etching process that is compatible with the standard COBRA active-passive process. The implementation of this broadband structure allows for wafer-scale waveguide-loss and absolute-wavelength measurements.",

author = "{Lemos Alvares Dos Santos}, R.M. and D. D'Agostino and F.M. Soares and {Rabbani Haghighi}, H. and M.K. Smit and X.J.M. Leijtens",

year = "2013",

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Lemos Alvares Dos Santos, RM, D'Agostino, D, Soares, FM, Rabbani Haghighi, H, Smit, MK & Leijtens, XJM 2013, Fabrication and characterization of a wet-etched InP-based vertical coupling mirror. in XJM Leijtens & D Pustakhod (uitgave), Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven. Technische Universiteit Eindhoven, Eindhoven, blz. 179-182.

Fabrication and characterization of a wet-etched InP-based vertical coupling mirror. / Lemos Alvares Dos Santos, R.M.; D'Agostino, D.; Soares, F.M. et al.
Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven. uitgave / X.J.M. Leijtens; D. Pustakhod. Eindhoven: Technische Universiteit Eindhoven, 2013. blz. 179-182.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Fabrication and characterization of a wet-etched InP-based vertical coupling mirror

AU - Lemos Alvares Dos Santos, R.M.

AU - D'Agostino, D.

AU - Soares, F.M.

AU - Rabbani Haghighi, H.

AU - Smit, M.K.

AU - Leijtens, X.J.M.

PY - 2013

Y1 - 2013

N2 - In this work we describe the fabrication and characterization of couplers realized with a wet etching process that is compatible with the standard COBRA active-passive process. The implementation of this broadband structure allows for wafer-scale waveguide-loss and absolute-wavelength measurements.

AB - In this work we describe the fabrication and characterization of couplers realized with a wet etching process that is compatible with the standard COBRA active-passive process. The implementation of this broadband structure allows for wafer-scale waveguide-loss and absolute-wavelength measurements.

M3 - Conference contribution

SN - 978-90-386-3512-5

SP - 179

EP - 182

BT - Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven

A2 - Leijtens, X.J.M.

A2 - Pustakhod, D.

PB - Technische Universiteit Eindhoven

CY - Eindhoven

ER -

Lemos Alvares Dos Santos RM, D'Agostino D, Soares FM, Rabbani Haghighi H, Smit MK , Leijtens XJM. Fabrication and characterization of a wet-etched InP-based vertical coupling mirror. In Leijtens XJM, Pustakhod D, redacteurs, Proceedings of the 18th Annual Symposium of the IEEE Photonics Benelux Chapter, 25-26 November 2013, Technische Universiteit Eindhoven. Eindhoven: Technische Universiteit Eindhoven. 2013. blz. 179-182

Fabrication and characterization of a wet-etched InP-based vertical coupling mirror

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