Experimental determination of lens aberrations from the intensity point-spread function in the focal region

P. Dirksen, J.J.M. Braat, A.J.E.M. Janssen, C.A.H. Juffermans, A. Leeuwestein

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

8 Citaten (Scopus)

Samenvatting

In this paper we show various results of aberration retrieval using the pinhole method in conjunction with the extended Nijboer-Zernike theory. The experiments are performed on modern wafer scanners. Keyboard commanded offsets of the movable lens elements of the imaging tool have been used to introduce astigmatism, coma and spherical aberration in a controlled way. The method is designed to estimate these induced aberrations and we show the experimental results regarding the various types of aberrations created this way.
Originele taal-2Engels
TitelProceedings Optical Microlithography XVI, 25 - 28 February 2003, Santa Clara, California
Plaats van productieBellingham
UitgeverijSPIE
Pagina's1-10
DOI's
StatusGepubliceerd - 2003

Publicatie series

NaamProceedings of SPIE
Volume5040
ISSN van geprinte versie0277-786X

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