Expanding thermal plasma: fundamentals and applications

R.A.H. Engeln, S. Mazouffre, P.J.W. Vankan, D.C. Schram

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademic


Expanding thermal plasmas are interesting both from a fundamental point of view as well as from a view of the applicability. From a fundamental point of view, the plasma expansion is the basis for describing phenomena ranging from astrophysical objects and solar flares, the flow into the divertor regime of a Tokamak, to laser spots and vacuum arc spots. In view of the applicability, expanding thermal plasmas are used for deposition, etching, passivating, and treating archaeological artifacts. In this case optimal energy conversion from the plasma source, via the expanding plasma to the gases used for deposition or etching, is of eminent importance. The study of the expansion substantiates the understanding of the conversion process. During the presentation new results in the understanding of plasma expansion and the influence of these results on the application of plasma expansion will be discussed
Originele taal-2Engels
TitelProceedings of the 25th International Conference on Phenomena in Ionised Gases (XXV ICPIG 2001) 17-22 July 2001, Nagoya, Japan
RedacteurenT. Goto
Plaats van productieNagoya, Japan, July 17-22, 2001
UitgeverijNagoya University
ISBN van geprinte versie4-9900915-3-1
StatusGepubliceerd - 2001
Evenement25th International Conference on Phenomena in Ionized Gases (ICPIG 2001), July 17-22, 2001, Nagoya, Japan - Nagoya, Japan
Duur: 17 jul 200122 jul 2001


Congres25th International Conference on Phenomena in Ionized Gases (ICPIG 2001), July 17-22, 2001, Nagoya, Japan
Verkorte titelICPIG 2001
AnderICPIG : International Conference on Phenomena in Ionized Gases ; 25 (Nagoya) : 2001.07.17-22


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