Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms

B.L. Williams; M. Ponomarev; M.A. Verheijen; H.C.M. Knoops; L.A.A. Duval; M.C.M. van de Sanden; M. Creatore

doi:10.1002/ppap.201500179

Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms

B.L. Williams, M. Ponomarev, M.A. Verheijen, H.C.M. Knoops, L.A.A. Duval, M.C.M. van de Sanden, M. Creatore

Onderzoeksoutput: Bijdrage aan tijdschrift › Tijdschriftartikel › Academic › peer review

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Originele taal-2	Engels
Pagina's (van-tot)	54-69
Tijdschrift	Plasma Processes and Polymers
Volume	13
Nummer van het tijdschrift	1
DOI's	https://doi.org/10.1002/ppap.201500179
Status	Gepubliceerd - jan. 2016

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10.1002/ppap.201500179

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title = "Expanding thermal plasma deposition of Al-doped ZnO: On the effect of the plasma chemistry on film growth mechanisms",

keywords = "deposition, diagnostics, modification, plasma, polymers",

author = "B.L. Williams and M. Ponomarev and M.A. Verheijen and H.C.M. Knoops and L.A.A. Duval and {van de Sanden}, M.C.M. and M. Creatore",

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AU - Knoops, H.C.M.

AU - Duval, L.A.A.

AU - van de Sanden, M.C.M.

AU - Creatore, M.

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KW - deposition

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KW - polymers

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