Evidence for Low-energy Ions Influencing Plasma-assisted Atomic Layer Deposition of SiO2: Impact on the Growth per Cycle and Wet Etch Rate

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Part of Research Highlights and Breakthroughs

@article{123dca85852e4b14b384dc1880e17f7e,

title = "Evidence for Low-energy Ions Influencing Plasma-assisted Atomic Layer Deposition of SiO2: Impact on the Growth per Cycle and Wet Etch Rate",

abstract = "Part of Research Highlights and Breakthroughs",

author = "W.M.M. Kessels",

year = "2020",

month = sep,

day = "1",

language = "English",

volume = "6",

journal = "ILTPC Newsletter",

publisher = "International Low Temperature Plasma Community (ILTPC)",

}

TY - JOUR

T1 - Evidence for Low-energy Ions Influencing Plasma-assisted Atomic Layer Deposition of SiO2: Impact on the Growth per Cycle and Wet Etch Rate

AU - Kessels, W.M.M.

PY - 2020/9/1

Y1 - 2020/9/1

N2 - Part of Research Highlights and Breakthroughs

AB - Part of Research Highlights and Breakthroughs

M3 - Article

VL - 6

JO - ILTPC Newsletter

JF - ILTPC Newsletter

ER -