EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology

Job Beckers (Corresponding author), Tijn van de Ven, Ruud van der Horst, Dmitry .I. Astakhov, Vadim Banine

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After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them. View Full-Text
Keywords: Extreme Ultraviolet; lithography; EUV; EUV-induced plasma; photon-induced plasma; MCRS; Electron density; Ion energy distribution function; IEDF; EUVL
TaalEngels
Artikelnummer2827
Aantal pagina's23
TijdschriftApplied Sciences
Volume9
Nummer van het tijdschrift14
DOI's
StatusGepubliceerd - 2 jul 2019

Vingerafdruk

Plasmas
Lithography
lithography
boom
Extreme ultraviolet lithography
rarefied gases
ultraviolet spectra
Beam plasma interactions
Distribution functions
Carrier concentration
energy distribution
Photons
Gases
distribution functions
Ions
photons
ions
interactions

Trefwoorden

    Citeer dit

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    title = "EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology",
    abstract = "After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades. A new application of EUV in lithography was the reason for such a growth. Naturally, an intensive development in such area produces a snowball effect of relatively uncharted phenomena. EUV-induced plasma is one of those. While being produced in the volume of a rarefied gas, it has a direct impact onto optical surfaces and construction materials of lithography machines, and thus has not only scientific peculiarity, but it is also of major interest for the technological application. The current article provides an overview of the existing knowledge regarding EUV-induced plasma characteristics. It describes common, as well as distinguishing, features of it in comparison with other plasmas and discusses its interaction with solid materials. This article will also identify the gaps in the existing knowledge and it will propose ways to bridge them. View Full-TextKeywords: Extreme Ultraviolet; lithography; EUV; EUV-induced plasma; photon-induced plasma; MCRS; Electron density; Ion energy distribution function; IEDF; EUVL",
    keywords = "Extreme Ultraviolet, lithography, EUV, EUV-induced plasma, photon-induced plasma, MCRS, Electron density, Ion energy distribution function, IEDF, EUVL",
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    EUV-induced plasma: a peculiar phenomenon of a modern lithographic technology. / Beckers, Job (Corresponding author); van de Ven, Tijn; van der Horst, Ruud; Astakhov, Dmitry .I.; Banine, Vadim.

    In: Applied Sciences, Vol. 9, Nr. 14, 2827, 02.07.2019.

    Onderzoeksoutput: Bijdrage aan tijdschriftTijdschriftartikelAcademicpeer review

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