Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Antonella Milella; Mariadriana Creatore; Michiel A. Blauw; Mauritius C.M. van de Sanden

doi:10.1002/ppap.200700127

Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

Antonella Milella
, Mariadriana Creatore
, Michiel A. Blauw
, Mauritius C.M. van de Sanden

Onderzoeksoutput: Bijdrage aan tijdschrift › Commentaar/Brief aan de redacteur › Academic › peer review

Originele taal-2	Engels
Pagina's (van-tot)	848-848
Aantal pagina's	1
Tijdschrift	Plasma Processes and Polymers
Volume	4
Nummer van het tijdschrift	9
DOI's	https://doi.org/10.1002/ppap.200700127
Status	Gepubliceerd - 22 nov. 2007

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10.1002/ppap.200700127

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Milella, A., Creatore, M., Blauw, M. A., & van de Sanden, M. C. M. (2007). Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628)). Plasma Processes and Polymers, 4(9), 848-848. https://doi.org/10.1002/ppap.200700127

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title = "Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))",

author = "Antonella Milella and Mariadriana Creatore and Blauw, \{Michiel A.\} and \{van de Sanden\}, \{Mauritius C.M.\}",

year = "2007",

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Milella, A, Creatore, M, Blauw, MA & van de Sanden, MCM 2007, 'Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))', Plasma Processes and Polymers, vol. 4, nr. 9, blz. 848-848. https://doi.org/10.1002/ppap.200700127

Erratum: Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628)). / Milella, Antonella; Creatore, Mariadriana; Blauw, Michiel A. et al.
In: Plasma Processes and Polymers, Vol. 4, Nr. 9, 22.11.2007, blz. 848-848.

Onderzoeksoutput: Bijdrage aan tijdschrift › Commentaar/Brief aan de redacteur › Academic › peer review

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T2 - Remote plasma deposited silicon dioxide-like film densification by means of RF substrate biasing: Film chemistry and morphology (Plasma Processes and Polymers (2007) vol. 4 doi: 10.1002/ppap.200700007 (621-628))

AU - Milella, Antonella

AU - Creatore, Mariadriana

AU - Blauw, Michiel A.

AU - van de Sanden, Mauritius C.M.

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DO - 10.1002/ppap.200700127

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EP - 848

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JF - Plasma Processes and Polymers

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