Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

L.J.M. Selen; F.J.J. Janssen; L.J. Van Ijzendoorn; M.J.A. De Voigt; M.J.J. Theunissen; P.J.M. Smulders; T.J. Eijkemans

doi:10.1063/1.1463446

Erratum: Ion-channeling analysis of boron clusters in silicon (Journal of Applied Physics (2001) 90 (4741))

L.J.M. Selen
, F.J.J. Janssen
, L.J. Van Ijzendoorn
, M.J.A. De Voigt
, M.J.J. Theunissen
, P.J.M. Smulders
, T.J. Eijkemans

Photonics and Semiconductor Nanophysics

Onderzoeksoutput: Bijdrage aan tijdschrift › Commentaar/Brief aan de redacteur › Academic › peer review

1 Citaat (Scopus)

148 Downloads (Pure)

Originele taal-2	Engels
Pagina's (van-tot)	5507
Aantal pagina's	1
Tijdschrift	Journal of Applied Physics
Volume	91
Nummer van het tijdschrift	8
DOI's	https://doi.org/10.1063/1.1463446
Status	Gepubliceerd - 15 apr 2002

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AU - Selen, L.J.M.

AU - Janssen, F.J.J.

AU - Van Ijzendoorn, L.J.

AU - De Voigt, M.J.A.

AU - Theunissen, M.J.J.

AU - Smulders, P.J.M.

AU - Eijkemans, T.J.

PY - 2002/4/15

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