Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen; P. Poodt; R. Olieslagers; A. Lankhorst; M. Van Den Boer; Dennis van den Berg; A. Van Asten; F. Roozeboom

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

R. Knaapen, P. Poodt, R. Olieslagers, A. Lankhorst, M. Van Den Boer, Dennis van den Berg, A. Van Asten, F. Roozeboom

Plasma & Materials Processing

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

1 Citaat (Scopus)

64 Downloads (Pure)

Samenvatting

A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al₂O₃ can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

Originele taal-2	Engels
Titel	Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012
Uitgeverij	European Society for Precision Engineering and Nanotechnology
Pagina's	36-39
Aantal pagina's	4
Volume	1
ISBN van elektronische versie	9780956679000
Status	Gepubliceerd - 1 jan. 2012
Evenement	12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012) - Stockholm, Zweden Duur: 4 jun. 2012 → 8 jun. 2012 Congresnummer: 12

Congres

Congres	12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012)
Verkorte titel	EUSPEN 2012
Land/Regio	Zweden
Stad	Stockholm
Periode	4/06/12 → 8/06/12
Ander	EUSPEN's 12th International Conference & Exhibition

Toegang tot document

publishers versionDefinitieve gepubliceerde versie, 213 KB

Andere bestanden en links

Link to publication in Scopus

Citeer dit

Knaapen, R., Poodt, P., Olieslagers, R., Lankhorst, A., Van Den Boer, M., van den Berg, D., Van Asten, A., & Roozeboom, F. (2012). Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012 (Vol. 1, blz. 36-39). European Society for Precision Engineering and Nanotechnology.

@inproceedings{1eb39b7ada2449ce91b6cd40c0cea16c,

title = "Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes",

abstract = "A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.",

author = "R. Knaapen and P. Poodt and R. Olieslagers and A. Lankhorst and {Van Den Boer}, M. and {van den Berg}, Dennis and {Van Asten}, A. and F. Roozeboom",

year = "2012",

month = jan,

day = "1",

language = "English",

volume = "1",

pages = "36--39",

booktitle = "Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012",

publisher = "European Society for Precision Engineering and Nanotechnology",

note = "12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012), EUSPEN 2012 ; Conference date: 04-06-2012 Through 08-06-2012",

}

Knaapen, R, Poodt, P, Olieslagers, R, Lankhorst, A, Van Den Boer, M, van den Berg, D, Van Asten, A & Roozeboom, F 2012, Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. in Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. vol. 1, European Society for Precision Engineering and Nanotechnology, blz. 36-39, 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012), Stockholm, Zweden, 4/06/12.

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. / Knaapen, R.; Poodt, P.; Olieslagers, R. et al.
Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1 European Society for Precision Engineering and Nanotechnology, 2012. blz. 36-39.

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/Congresprocedure › Conferentiebijdrage › Academic › peer review

TY - GEN

T1 - Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

AU - Knaapen, R.

AU - Poodt, P.

AU - Olieslagers, R.

AU - Lankhorst, A.

AU - Van Den Boer, M.

AU - van den Berg, Dennis

AU - Van Asten, A.

AU - Roozeboom, F.

N1 - Conference code: 12

PY - 2012/1/1

Y1 - 2012/1/1

N2 - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

AB - A novel type of reactor has been designed for atmospheric atomic layer deposition (ALD) on flexible substrates. In the reactor, a flexible substrate slowly advances around a fast rotating drum. Gas bearing technology is used to prevent physical contact between the flexible substrate and the drum, and to separate reactants to enable a spatial ALD process. With a substrate speed of 1 m/min and drum rotational speed of 5 Hz, a layer of 100 nm of Al2O3 can be applied in a continuous roll-to-roll process at deposition rates of 1 nm/s. Higher speeds to ∼2 nm/s are foreseen to be possible.

UR - http://www.scopus.com/inward/record.url?scp=84911387671&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:84911387671

VL - 1

SP - 36

EP - 39

BT - Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012

PB - European Society for Precision Engineering and Nanotechnology

T2 - 12th International Conference of the European Society for Precision Engineering and Nanotechnology (EUSPEN 2012)

Y2 - 4 June 2012 through 8 June 2012

ER -

Knaapen R, Poodt P, Olieslagers R, Lankhorst A, Van Den Boer M, van den Berg D et al. Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes. In Proceedings of the 12th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2012. Vol. 1. European Society for Precision Engineering and Nanotechnology. 2012. blz. 36-39

Equipment for atmospheric, spatial atomic layer deposition in roll-to-roll processes

Samenvatting

Congres

Toegang tot document

Andere bestanden en links

Vingerafdruk

Citeer dit