Electron beam evaporated molybdenum oxide as hole-selective contact in 6-inch c-Si heterojunction solar cells

Mike Ah Sen, Pierpaolo Spinelli, Benjamin Kikkert, Eelko Hoek, Bart Macco, Arthur Weeber, Paula Bronsveld

Onderzoeksoutput: Hoofdstuk in Boek/Rapport/CongresprocedureConferentiebijdrageAcademicpeer review

6 Citaten (Scopus)

Samenvatting

Electron beam (E-beam) deposited molybdenum oxide (MoOx) has been investigated for its potential to replace p-type hydrogenated amorphous silicon (a-Si:H) in Si heterojunction (SHJ) solar cells. Excellent passivation was achieved for our best MoOx/c-Si junction based device, reaching an average implied Voc (iVoc) of 734 mV on textured, commercially available 6-inch Cz wafers. This confirms the compatibility of MoOx as a hole selective layer with industrial SHJ cell processing. A hole barrier was, however, observed for our MoOx-based solar cells due to inefficient hole extraction. The formation of this hole barrier can be related to annealing of MoOx and the presence of a native oxide grown on the intrinsic a-Si:H interface layer below. Pre-annealing, followed by an HF treatment on the a-Si:H(i) layer prior to MoOx deposition, proved to be useful to mitigate the formed barrier, while making it more stable under standard SHJ annealing conditions.

Originele taal-2Engels
TitelSiliconPV 2018, the 8th International Conference on Crystalline Silicon Photovoltaics
UitgeverijAmerican Institute of Physics
ISBN van geprinte versie9780735417151
DOI's
StatusGepubliceerd - 10 aug. 2018
EvenementSiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics - Lausanne, Zwitserland
Duur: 19 mrt. 201821 mrt. 2018

Publicatie series

NaamAIP Conference Proceedings
Volume1999

Congres

CongresSiliconPV 2018: The 8th International Conference on Crystalline Silicon Photovoltaics
Land/RegioZwitserland
StadLausanne
Periode19/03/1821/03/18

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