Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography

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No abstract.

Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

@conference{5151ad1a78984e2482583dc5766bdf18,

title = "Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography",

abstract = "No abstract.",

author = "\{Velden, van der\}, M.H.L. and \{Mullen, van der\}, J.J.A.M. and R. Moors",

note = "Poster presented at the 20st Symposium Plasma Physics \& Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands",

year = "2008",

language = "English",

pages = "--B26",

}

TY - CONF

T1 - Effect of hydrogen on the sputter rate of multilayer mirrors in extreme ultra-violet lithography

AU - Velden, van der, M.H.L.

AU - Mullen, van der, J.J.A.M.

AU - Moors, R.

N1 - Poster presented at the 20st Symposium Plasma Physics & Radiation Technology 2008, 4-5 March 2008, Lunteren, The Netherlands

PY - 2008

Y1 - 2008

N2 - No abstract.

AB - No abstract.

M3 - Poster

SP - -B26

ER -